Extra pattern defects

The main immersion-specific lithography defects reported in the literature fall into these general types particles, bubbles, water marks, extra patterns, resist residues, line thinning and swelling, bridging, B ARC blobs, and aerosols. Although the nature, origins, formation mechanisms, and effects of immersion defects... 

MicrocrystalUne zeolites such as beta zeolite suffer from calcination. The crystallinity is decreased and the framework can be notably dealuminated by the steam generated [175]. Potential Br0nsted catalytic sites are lost and heteroatoms migrate to extra-framework positions, leading to a decrease in catalytic performance. Nanocrystals and ultrafine zeolite particles display aggregation issues, difficulties in regeneration, and low thermal and hydrothermal stabilities. Therefore, calcination is sometimes not the optimal protocol to activate such systems. Application of zeolites for coatings, patterned thin-films, and membranes usually is associated with defects and cracks upon template removal. 

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