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ESCA electron spectroscopy for chemical

ESCA Electron spectroscopy for chemical analysis [106, 138-142] Same as XPS Same as XPS... [Pg.315]

EID = electron impact desorption ESCA = electron spectroscopy for chemical analysis ESD = electron-stimulated desorption ... [Pg.398]

X-ray photoelectron spectroscopy (XPS) is currently the most widely used surface-analytical technique, and is therefore described here in more detail than any of the other techniques. At its inception hy Sieghahn and coworkers [2.1] it was called ESCA (electron spectroscopy for chemical analysis), hut the name ESCA is now considered too general, because many surface-electron spectroscopies exist, and the name given to each one must be precise. The name ESCA is, nevertheless, still used in many places, particularly in industrial laboratories and their publications. Briefly, the reasons for the popularity of XPS are the exceptional combination of compositional and chemical information that it provides, its ease of operation, and the ready availability of commercial equipment. [Pg.6]

One other technique has become central in surface research this is X-ray photoelectron spectrometry, earlier known as ESCA, electron spectroscopy for chemical analysis . Photoelectrons are emitted from a surface irradiated by X-rays. The precautions which have to be taken to ensure accurate quantitative analysis by this much-used technique are set out by Seah (1980). [Pg.408]

The information contained in ESCA (Electron Spectroscopy for Chemical Analysis) spectra [331] makes the method particularly suitable for determinations of surface compositions, chemical bonding of surface atoms and changes which occur at solid surfaces during reaction [312], Applications of this technique to the study of reactions of and between solids are awaited with interest. [Pg.30]

X-ray photoelectron spectroscopy (XPS), which is synonymous with ESCA (Electron Spectroscopy for Chemical Analysis), is one of the most powerful surface science techniques as it allows not only for qualitative and quantitative analysis of surfaces (more precisely of the top 3-5 monolayers at a surface) but also provides additional information on the chemical environment of species via the observed core level electron shifts. The basic principle is shown schematically in Fig. 5.34. [Pg.244]

ESCA Electron Spectroscopy for Chemical Analysis (also called XPS)... [Pg.4]

XPS or ESCA (electron spectroscopy for chemical analysis) is a surface sensitive technique that only probes the outer atomic layers of a sample. It is very useful tool to study polymer surfaces [91]. An XPS spectrum is created by focusing a monochromatic beam of soft (low-energy) X-rays onto a surface. The X-rays cause electrons (photoelectrons) with characteristic energies to be ejected from an electronic core level. XPS, which may have a lateral resolution of ca. 1-10 pm, probes about the top 50 A of a surface. [Pg.433]

The nature of the surface of organogermanium films, obtained by magnetically enhanced rf-plasma deposition from tetraethylgermane, was examined by ESCA (electron spectroscopy for chemical analysis) and FTIR methods56. [Pg.348]

Auger analysis and ESCA (electron spectroscopy for chemical analysis) of the cleaned wafers showed no contaminants. However, the ammonium hydroxide solution produced a high mobile-ion content in the grown films. [Pg.323]

Electron beam techniques have aided electrical measurements greatly, but these methods often lack sensitivity (X-ray and Auger spectroscopy and ESCA [electron spectroscopy for chemical analysis]) and accuracy (SIMS [secondary-ion mass spectrometry], etc.), two attributes that are of prime importance in IC process technology. Fortunately, materials can be analyzed with both accuracy and sensitivity by wet chemical analysis. [Pg.514]


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