Wafer cleaning

Undeniably, one of the most important teclmological achievements in the last half of this century is the microelectronics industry, the computer being one of its outstanding products. Essential to current and fiiture advances is the quality of the semiconductor materials used to construct vital electronic components. For example, ultra-clean silicon wafers are needed. Raman spectroscopy contributes to this task as a monitor, in real time, of the composition of the standard SC-1 cleaning solution (a mixture of water, H2O2 and NH OH) [175] that is essential to preparing the ultra-clean wafers. 

The high purity required of sificon and the small size of semiconductor devices place stringent limits on the chemicals used in processing sificon. By far the most important chemical is water which is used extensively to dilute etchants and clean wafers. Pure water (24) is required to have fewer than 0.025... 

Auger analysis and ESCA (electron spectroscopy for chemical analysis) of the cleaned wafers showed no contaminants. However, the ammonium hydroxide solution produced a high mobile-ion content in the grown films. 

Fig. 8 OSDA images observed for as-epitaxial wafer (a), as-polished wafer (b), and as-3 times cleaned wafer with SCI solution (c).

CLEAN WAFERS (organic, oxide removal, inorganic)... 

CONTROL WAFERS 9. AL DEPOSITION PHOTOLITH- AL CLEAN WAFER... 

Pod (semiconductor processing) A clean wafer carrier often designed to mate with the processing system through SMIF. 

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