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Electron processors

Yield factor Yield factor is used to characterize the curing performance of an electron processor. It is a constant that relates the delivered dose to the beam current and line speed ... [Pg.38]

Includes 15 hp compressor for providing ouput at 100 psi. The total energy requirements for this system will be made of the input to the electron processor, the fuel for the inert gas system and its compressor power ... [Pg.63]

All conversions measured for thin films (type laboratory electron processor. [Pg.74]

Mott, N. F. Davis, E. A. (1971) Electronic Processors in Non-crystalline Materials, Oxford, Clarendon Press. [Pg.468]

Nablo, S. "Radiation Safety Considerations in the Use of Self-Shielded Electron Processors" in Rad. Phys. Chem. 1983, Vol. 22, No 3-5, 369-377. [Pg.36]

Modern electron processors offer high speed (high dose-rate) curing of low viscosity liquid coatings so that surface modification of films becomes practicable. A process has been developed for grafting vinyl monomers to polyolefin film surfaces with the aid of functional silane primers using electron initiated polymerization. [Pg.534]

Figure 1. Schematic view of a curtain-type selfshlelded electron processor. The product path typically Involves a modest angle change to facilitate radiation shielding. An Inert gas knife coupled with a small process volume eliminates oxygen Inhibition and ozone generation problems. Process speeds to 300 m/mlnute are typical. Figure 1. Schematic view of a curtain-type selfshlelded electron processor. The product path typically Involves a modest angle change to facilitate radiation shielding. An Inert gas knife coupled with a small process volume eliminates oxygen Inhibition and ozone generation problems. Process speeds to 300 m/mlnute are typical.
With the power off, there was no way of regaining control through the bitek processors. Every platform would have to be reactivated manually. Which was exactly what Kiera had done. Spacecraft had rendezvoused with the platforms and taken out Rubra s bitek management processors, replacing them with electronic processors and new fire authority codes. [Pg.348]

Figure 46.20 shows a schematic of an electron processor. The electron processor is a stainless steel vacuum tube in which one or more longitudinal heated-filament electron guns are raised to a potential of several kilovolts. The electrons are then accelerated as they move from the filaments to the perimeter of the tube. A slot in the tube defining the width of the processing zone permits the accelerated electrons to reach a metallic foil window that is thin at ground potential. [Pg.928]

The most often discussed application of SPAs is optical interconnection. All applications of these arrays involve optical interconnection in one way or another, but the term optical interconnection most often refers to optical data channels between electronic processors and devices. This includes data transfer between machines, racks, boards, and chips. SPAs are being developed for optical interconnection at the board and chip level where the demand is very high for the dense packaging of the electronic and optical devices. Figure 2 illustrates two of several envisioned configurations for board-to-board and chip-to-chip optical interconnection. [Pg.280]

The detector and detector electronics The detector and its electronic processor provide an electrical response that is linearly related to solute concentration as it leaves the column. Thus, the elution time can be measured and the concentration profile of an eluted solute can be monitored. The most common detectors are the flame ionization detector, the katharo-meter, and the electron capture detector. [Pg.1160]


See other pages where Electron processors is mentioned: [Pg.426]    [Pg.418]    [Pg.48]    [Pg.48]    [Pg.52]    [Pg.53]    [Pg.56]    [Pg.73]    [Pg.52]    [Pg.53]    [Pg.56]    [Pg.535]    [Pg.13]    [Pg.962]    [Pg.963]   


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