Electrodeposition of Reactive Elements from Ionic Liquids

Electrodeposition of Reactive Elements from Ionic Liquids 

Fachgebiet Elektrochemie und Galvanotechnik, Technische Universitaet Ilmenau, Ilmenau, Germany 5.3.1 Introduction 

Ionic liquids are interesting media for the electrodeposition of metals, alloys, and senoiconductors, despite the fact that they are more expensive than aqueous baths. Due to their large electrochemical windows and their good thermal and chemical stability, they are used nowadays to electrodeposit metals that can also be obtained from aqueous solution, such as Cr, Ag, Ni, Cu, but also to electrodeposit metals that cannot be obtained from aqueous baths. This paper deals with the electrodeposition of Si and Ta in the ionic liquid butyl-methyl-pyrrolidinium bis(trifluoro)sulfonyl imide ([BMP][TFSI]). Compared to other deposition techniques, such as chemical vapor deposition or plasma vapor deposition, electrodeposition is a relatively simple technique and in many cases significantly cheaper. Moreover, materials of different shapes and dimensions can be obtained relatively easy by electrodeposition. Thus, for industrial applications, it would be highly interesting to obtain reactive metals and semiconductors by electrodeposition. 

Molten Salts Chemistry and Technology, First Edition. Edited by Marcelle Gaune-Escard and Geir Martin Haarberg. 2014 John Wiley Sons, Ltd. Published 2014 by John Wiley Sons, Ltd. 

This paper focuses on the investigation of the electrodeposition process of Ta and Si thin layers from [BMP] [TFSl]. Cyclic voltammetry, in situ microgravimetry and rotating ring disk electrode were the methods used for characterizing the electrodeposition process. The properties of the deposited layers were studied by SEM, EDX, XPS, and XRD techniques. 

---

Electrodeposition of Reactive Elements from Ionic Liquids 361... 

---