Plasma vapor deposition

Fig. 21. Schematic illustration of the four primary vapor-phase deposition processes used in optical-fiber fabrication outside vapor deposition (OVD), modified chemical vapor deposition (MCVD), plasma vapor deposition (PVD), and vapor axial deposition (VAD) (115).

Transparent Vitreous Silica. Clear, transparent, bubble-free vitreous sihca may be obtained by melting natural quart2 minerals, ie, fused quart2, by flame or plasma vapor deposition (synthetic fused siUcas), and by sol—gel processing. 

Fig. 4.37. Depth (temporal) profile obtained on a multilayer coating produced by plasma vapor deposition (PVD) using optimized rf-glow discharge conditions. Layer thickness ...

The development of vapor deposition techniques like chemical vapor deposition (CVP), plasma vapor deposition (PVD), or molecular beam epitaxy (MBE) have tempted electro-chemists to prepare such films from a liquid phase with electrochemical reactions. Chemical processes can stimulate the film formation, e.g., the decomposition of precursors like sulfur compounds in the presence of metal ions like cadmium. Insoluble CdS is formed and a film is deposited by crystallization on a substrate. ... 

Ionic liquids are interesting media for the electrodeposition of metals, alloys, and senoiconductors, despite the fact that they are more expensive than aqueous baths. Due to their large electrochemical windows and their good thermal and chemical stability, they are used nowadays to electrodeposit metals that can also be obtained from aqueous solution, such as Cr, Ag, Ni, Cu, but also to electrodeposit metals that cannot be obtained from aqueous baths. This paper deals with the electrodeposition of Si and Ta in the ionic liquid butyl-methyl-pyrrolidinium bis(trifluoro)sulfonyl imide ([BMP][TFSI]). Compared to other deposition techniques, such as chemical vapor deposition or plasma vapor deposition, electrodeposition is a relatively simple technique and in many cases significantly cheaper. Moreover, materials of different shapes and dimensions can be obtained relatively easy by electrodeposition. Thus, for industrial applications, it would be highly interesting to obtain reactive metals and semiconductors by electrodeposition. 

CVD, chemical vqx>r deposition PVD. plasma vapor deposition HIP, hot isostatically pressed. Copyright AEA Technology pic used with permission. Source Rrf 2... 

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