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Silicon dioxide effective charge

Schematic diagram showing how placing a thin layer of highly dispersed carbon onto the surface of a metal filament leads to an induced dipolar field having positive and negative image charges. The positive side is always on the metal, which is much less electronegative than carbon. This positive charge makes it much more difficult to remove electrons from the metal surface. The higher the value of a work function, the more difficult it is to remove an electron. Effectively, the layer of carbon increases the work function of the filament metal. Very finely divided silicon dioxide can be used in place of carbon. Schematic diagram showing how placing a thin layer of highly dispersed carbon onto the surface of a metal filament leads to an induced dipolar field having positive and negative image charges. The positive side is always on the metal, which is much less electronegative than carbon. This positive charge makes it much more difficult to remove electrons from the metal surface. The higher the value of a work function, the more difficult it is to remove an electron. Effectively, the layer of carbon increases the work function of the filament metal. Very finely divided silicon dioxide can be used in place of carbon.
Figure 4.22 Schematic diagram of a field effect transistor. The silicon-silicon dioxide system exhibits good semiconductor characteristics for use in FETs. The free charge carrier concentration, and hence the conductivity, of silicon can be increased by doping with impurities such as boron. This results in p-type silicon, the p describing the presence of excess positive mobile charges present. Silicon can also be doped with other impurities to form n-type silicon with an excess of negative mobile charges. Figure 4.22 Schematic diagram of a field effect transistor. The silicon-silicon dioxide system exhibits good semiconductor characteristics for use in FETs. The free charge carrier concentration, and hence the conductivity, of silicon can be increased by doping with impurities such as boron. This results in p-type silicon, the p describing the presence of excess positive mobile charges present. Silicon can also be doped with other impurities to form n-type silicon with an excess of negative mobile charges.
In addition to silica (silicon dioxide SiO ), the crystal form of silicon is found in several semiprecious gemstones, including amethyst, opal, agate, and jasper, as well as quartz of varying colors. A characteristic of quartz is its piezoelectric effect. This effect occurs when the quartz crystal is compressed, producing a weak electrical charge. Just the opposite occurs when electric vibrations are fed to the crystal. These vibrations are then duphcated in the crystal. Quartz crystals are excellent timekeeping devices because of this particular characteristic. [Pg.195]

Metal oxide semiconductor field-effect transistors (MOSFETs) are field effect transistors with a thin film of silicon dioxide between the gate electrode and the semiconductor. The charge on the silicon dioxide controls the size of the depletion zone in the polype semiconductor. MOSFETs are easier to mass produce and are used in integrated circuits and microprocessors for computers and in amplifiers for cassette players. Traditionally, transistors have been silicon based but a recent development is field-effect transistors based on organic materials. [Pg.196]

Hofmann and Thomas (31) have discussed the effect of ion bombardment on thermally grown silicon dioxide. XPS showed that small changes in the surface chemistry were observable. The Si 2p and 0 Is peaks were seen to broaden due to ion damage trtilch presumably Increased bond-angle disorder resulting in charge redistribution. [Pg.153]

Uses For producing screening smokes (British attack on Zeebrugge). In combination with ammonia vapor it forms smokes which resemble natural fog and which are effective for camouflaging troop or ship movements. The smoke is generated from a smoke funnel. One cylinder contains liquid ammonia the other cylinder is charged with silicon tetrachloride containing about 10 per cent carbon dioxide under a maximum pressnre of 550 lb/sq. in. at 55°. [Pg.132]


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See also in sourсe #XX -- [ Pg.267 , Pg.273 ]

See also in sourсe #XX -- [ Pg.267 , Pg.273 ]




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