ED polymers

The ED polymers described in section 2.3 are not effective on their own as resists for primary imaging, etch-resists or any other application. The addition of other components to the resist is necessary for the formulation of workable products. Some typical resist additives for both negative- and positive-working photoresists are described in the following sections. Most of these additives are also incorporated into ED resists for other applications. 

Polymers for ED resists have been covered extensively in section 2.3. The polymer contains ionizable groups for both electrodeposition 

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