Dry resists

Dry resist hlms are formulated from components described in earlier sections and are typically sandwiched between a polyester base sheet and a polyethylene protective cover foil. At the point of use, the resist him is separated from its base 

Brinkman, G. Delzenne, A. Foot, and J. Williams, Unconventional Imaging Processes, p. 32, Focal, London (1978). 

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Resiheut, compressible and strong, but not impermeable. Resists medium-strength mineral acids and dilute mineral solutions if not intermittently dried. Resists oils, greases, waxes, most solvents. Damaged by alkahes. 

Acrylic Acrylonitrile units, 85% or more Warm, lightweight, shape-retentive, resilient, quick-drying, resistant to sunlight Carpeting, sweaters, skirts, baby cloths, socks, slacks, blankets, draperies Orion... 

The microstructure was realized by a dry-film photoresist technique and based on established techniques from printed circuit board technology [142], Dry resists are available as thin films, e.g. of thickness 50 or 100 pm. The resist films are encased in other polymer materials which are later removed. The resist films can be deposited on various base materials such as silicon or polymers giving mechanical stability. Lamination is carried out with a roller laminator. Then, exposure is made and spray development without any solvents follows. The process steps can be repeated at multi-laminated structures. Closed structures can be made in this way. 

Due to the inherent dry nature of CVD technique, CVD polymers can be utilized as dry resist coatings. Dry resist lithography is advantageous over conventional wet resist techniques because, the whole process can be performed in a unified vacuum chamber. The... 

Photoinitiated polymerization in negative resists used in lithography has found its main applications in lithographic offset plates in dry resists used in the printing of... 

M.W. Horn, S.W. Pang, and M. Rothschild, Plasma deposited organosilicon thin films as dry resists for deep ultraviolet lithography, J. Vac. Sci. Technol. B 8, 1493 (1990). 

Bursting strength—dry Bursting strength—dry Resistance to microbial penetration—dry... 

Resistance to microbial penetration - dry Resistance to microbial penetration - wet Cleanliness - microbial Cleanliness - particulate matter Linting... 

There is a variety of photoresist materials on the market. Some of these photosensitive materials are negative types and some are positive. Both wet and dry resist materials may be used. It is beyond the scope of this section to discuss the advantages and disadvantages of each. The reader is directed to the references for additional information on the subject [20-22]. 

Kobayashi, Y Saito, S. Marking inks with pen-point drying resistance. Jpn. Kokai Tokkyo Koho JP 01087675,1989. 

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