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Displacement, fabric

Hollow-fiber designs are being displaced by spiral-wound modules, which are inherently more fouling resistant, and require less feed pretreatment. Also, thin-film interfacial composite membranes, the best reverse osmosis membranes available, have not been fabricated in the form of hoUow-fine fibers. [Pg.75]

Displacement of a volatile with a nonvolatile alcohol is an important reaction for curing paint films with amino cross-linkers and amino resias on textile fabrics or paper. FoUowiag is an example of a methoxymethyl group on an amino resia reacting with a hydroxyl group of a polymer chain. [Pg.325]

Impact testing is not required if the design temperature is helow —29 C (—20 F) hut at or above —46 C (—50 F) and the maximum operating pressure of the fabricated or assembled components will not exceed 25 percent of the maximum allowable design pressure at ambient temperature and the combined longitudinal stress due to pressure, deadweight, and displacement strain (see Par. 319.2.1) does not exceed 41 MPa (6000 Ibfiin ). [Pg.1006]

The basic stitch produced in warp knitting is the chain stitch. The yam is looped around the needle stem and another loop of the yam is formed in the hook of the needle and is then pulled through the first loop, itself then becoming the loop held on the needle shaft, whilst another loop is formed in the hook. In this way a chain of interlaced loops is formed. By displacing every other loop onto the next needle, the chains of interlaced loops are linked together to form the simple knotted tricot structure. If one of the yam loops become broken in this type of fabric then the whole fabric, in the line of the yam, will unzip . This problem can be overcome by displacing the throw of the stitches. [Pg.187]

Liquid Crystal Displays (LCD). Liquid crystal displays, once limited to small devices such as calculators, are now displacing color CRT (cathode ray tube) displays in commercial quantities. The ability to fabricate these display devices at high quality and at low cost is partially due to the wider spread use of photopolymer-based materials. Photopolymer technology is being used for the alignment of liquid crystal (LC) elements (49), the orientation of ferroelectric materials (50), the synthesis of LC polymers (57) and the manufacture of color filters for liquid crystal display applications (52). [Pg.8]

Figure 21.1 A-Structure of the host PAPAM dendrimer. B-Fabrication procedure for metal-dendrimer nanocomposites. C- Pd and Pt dendrimer encapsulated nanoparticles prepared by displacement reactions [66]. D, E -External and internal dendrimer nanocomposite topologies, respectively [70,77],... Figure 21.1 A-Structure of the host PAPAM dendrimer. B-Fabrication procedure for metal-dendrimer nanocomposites. C- Pd and Pt dendrimer encapsulated nanoparticles prepared by displacement reactions [66]. D, E -External and internal dendrimer nanocomposite topologies, respectively [70,77],...
Bychkova V, Shvarev A (2009) Fabrication of micrometer and submicrometer-sized ion-selective optodes via a solvent displacement process. Anal Chem 81 2325-2331... [Pg.223]

The load-displacement curves for the orthogonal interlock fabric composites show a non-linear unloading sequence and an appreciable permanent deformation after unloading, with the crack tip not completely closed (Guenon et al., 1987). These observations are attributed to the crack closure process of the three-dimensional fabric composites where through-the-thickness yarns break near the outer surface of the specimen. [Pg.354]

In other studies on MOS structures, the two types of hysteresis, normal and abnormal, are suggested to arise from the ion displacement in the insulator and to the trapping at the interface states. The presence of site-radiation-induced polymerization has been used to provide increased film stability and has been described as an application for high-resolution electron beam lithography for the fabrication of microcircuitry. [Pg.98]


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Textile Fabric Force-Displacement Curve

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