Deposition mode

Deposition mode Substrate temperature Mobility References... 

Shikazono, N., Holland, H.D. and Quirk, R.F. (1983) Anhydrite in Kuroko deposits mode of occurrence and depositional mechanisms. Econ. Geol. Mon., 5, 329-344. 

Two specific illustrative cases of the extreme limits of behavior are given by Al deposition on CH3 and -COOCH3 terminated hexadecanethiolate/Au SAMs [20, 21]. The -CH3 terminated SAM case shows a spectrum of deposition modes, including penetration to the Au-SAM interface and ambient surface overlayer formation. The penetration was explained in terms of Al atoms diffusing into dynamically formed temporal vacancies in the SAM (see Sect. 2) caused by fluctuations of Au thiolate moieties around their equilibrium positions on the Au substrate [11-13]. Once the Al atoms arrive at the substrate, energetically favorable insertion into S Au bonds can occur. This in turn can result in strongly decreased... 

Films may be formed only in downstroke (X-type, Fig. 4b). The deposition speed may affect the deposition mode (16,17). If deposition occurs only when films are formed in upstroke Z-type films result (Fig. 4c). These are cases where the head group is not as hydrophilic, eg, COOCH3 (18), or where the alkyl chain is terminated by a weak polar group, eg, N02 (19). In both cases the interactions between adjacent monolayers are... 

Figure 15. (a) A schematic representation of organic amphiphilic molecules at air-water interface, (b) Schematic representation of the various deposition modes for monolayer films and the resulting L-B assemblies. (Reproduced with permission from H. Kuhn, D. Mobius, and H. Bucher, Physical Methods of Chemistry, Vol. I, Part IIIB, A. Weissberger and B. W. Rossiter, Eds., Wiley, New York, 1972, p. 577.)... 

Chester, R., Murphy, K.J.T., Lin, F.J., Berry, A.S., Bradshaw, G.A. and Corcoran, PA. (1993a) Factors controlling the solubilities of trace metals from non-remote aerosols deposited to the sea surface by the dry deposition mode. Mar. Chem., 42, 107-126. 

Other deposition modes were observed as well, namely X-deposition, when the film transfer occurs only at downstrokes [39], and Z-deposition, when the film transfer occurs only at upstrokes [6]. X- or Z-mode deposition occurs more commonly in the films consisting of amphiphilic molecules where either the head group is only weakly polar (such as ester) or the terminal group of the hydrophobic tail is not a methyl. 

Another advantage of OVPD over VTE is the ability to control surface morphology (Table 9.1, no. 10). Use of two different deposition modes in OVPD enables active design of layer morphology and interfaces with very valuable properties for device improvements this is of particular importance for high-performance organic TFTs. 

Another promising class of copper(II) S-diketonates has been synthesized by Toscano and Welch by substitntion of a carbon atom by silicon Copper(II) sila-/ -diketonates and their fluorinated derivatives have greater volatility than the corresponding carbon-hydrogen analogues and some of them exist as liqnids or low melting solids, the preferred state for industrial CVD processes. Two different deposition modes of this class of precursors are also discussed (Scheme 3). ... 

SCHEME 3. Deposition modes for Cu(II) a-fluoroalkyl-a -t]jalkylsila-/S-diketonates . Reproduced from Reference 130 by permission of Elsevier... 

Figure 6.11 Effect of plasma deposition mode on the ESR signal of CH4 obtained by (a) the AF discharge method (115 W, lOOmtorr, 90 min) (b) the DC cathodic method (5W, 50mtorr, 3 min). Field sweep settings as in (2a).

The approach to HTSC electrosynthesis described in this section is entirely analogous to that used for the production of semiconductive films such as CujcInj,S(Se)j [205,206]. The thermal treatment of electrodeposited metallic precursors carried out in an H2S(Se) atmosphere in some cases proved more successful than the cathodic codeposition of sulfur or selenium with the metals [207]. There is also an analogy with other combined methods of selenide preparation the sputtering of copper or indium followed by cathodic deposition of selenium [208], and the chemical reaction of selenium with metals. In this case, as in the deposition of incomplete HTSC precursors [189], the use of the deposition mode is much easier. 

Figure 5. Comparison of solvent deposition modes for the MBI unit in the separation of various hybrocarbons (a) continuous flow (b) spray deposition. [From reference 251...

Fig. 3 Illustration of the potential as a function of time for potentiostatic and pulsed deposition modes.

Electrodeposition is an elegant and efficient technique for the production of nano-objects. Using the pulse deposition mode, it is possible to control the amount of atoms to be deposited with great precision. That is, pulsing with pulse durations of a few milliseconds to a few seconds, allows the deposition of clusters of atoms or layers with thickness of a few to hundreds of nanometers. 

Remarkably, a prominent Cu stripping was obtained in contact with Bi NPFg/ MeCN and M li NPFg/Mef N electrolytes but not in contact with LiClOyMeCN. This difference can be attributed to a different metal deposition mode associated with the different permeability of the material to cation transport (vide infra). 

FIGURE 5.12 Pictorial representation of metal deposition modes for (a) Cu-MOF, (b) Zn-MOF. 

The major goal of our work is the elucidation of the deposition mode and the local stmctures of the title species formed on the surface of titania during the equilibration step of EDF. To achieve this target we use jointly several methodologies, described in detail elsewhere [8]. These methodologies are combined with several spectroscopic techniques [e.g. Diffuse Reflectance Spectroscopy (DRS) and Laser Raman Spectroscopy (LRS)] as well as with ab-initio calculations for the determination of the kinds of the surface oxygens, their charges and relative concentrations. 

Ice Nuclei Ice particles can be formed through a variety of mechanisms. All of these require the presence of a particle, which is called an ice nucleus (IN). These mechanisms are (1) water vapor adsorption onto the IN surface and transformation to ice (deposition mode), (2) transformation of a supercooled droplet to an ice particle (freezing mode), and (3) collision of a supercooled droplet with an IN and initiation of ice formation (contact mode). 

Based on the dependences (T) and FsputlT) described by relations (8-102) and (8-104), it is easy to figure out that the function (Fsput) is not monotonic and has maximum and minimum points if a 1. As a result, the reverse function Fsput( ) has a reverse S-shape and exhibits the lysteresis behavior - increase and decrease of the reactive gas flow rate result in changing the reactive sputter deposition modes (from metallic to covered mode and back) at different flow rates. 

The gas metal arc welding operation is characterized on the basis of the filler deposition mode on the material melting bath spray, drop, short arc, and pulsed arc (Kalpakjian 1997 Schey 1997). 

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