Czochralski crystal growth simulation

V.V. Kalaev and A.l. Zhmakin, 2002, Large Eddy Simulation of Melt Convection during Czochralski Crystal Growth ,... 

J. Jaervinen, R. Nieminen, T. Tiihonen. Time-dependent simulation of Czochralski silicon crystal growth. J Cryst Growth 750 468, 1997. 

The calculations were carried out in the framework of the model of point defect dynamics, i.e., for the same crystals with the same parameters as in already the classical work on the simulation of microvoids and interstitial dislocation loops (A-microdefects) (Kulkarni et al., 2004). According to the analysis of the modern temperature fields used when growing crystals by the Czochralski method, the temperature gradient was taken to be G = 2.5 K/ mm (Kulkarni et al., 2004). The simulation was performed for crystals 150 mm in diameter, which were grown at the rates Vg = 0.6 and 0.7 mm/ min. These growth conditions correspond to the growth parameter Vg/ G >... 

A numerical model for simulation of the global heat transfer and the melt flow in the Czochralski growth of large silicon crystals is presented. The key model features are an extended 3D domain for the 2D/3D computations and a hybrid LES/RANS approach to turbulence modeling. It is shown that use of parallel computations on affordable multiprocessor systems assembled from the COTS hardware could reduce the turn-around time of simulation by an order of magnitude. The model validation using the experimental data on the growth of 100-mm and 300-mm silicon crystals in the industrial pullers Ekz-1300 and Ekz-2405 has proved its predictive power. 

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