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Copper/graphite systems

A system based on a copper redox system [55] is a combined electrolytic and catalytic process carried out in a three-compartment cell. The cell consists of a central packed bed anode of graphite separated by an ion exchange membrane from a packed cathode bed of copper on one side, and on the other side a packed bed of Cu which acts as an absorber. In the absorption chamber the copper, after first being oxidised to cuprous oxide, is responsible for the oxidation of SO2 to sulphuric acid. [Pg.385]

The HF-SbFs system is known to be a superacid H34). The possible relevance of this to the intercalation process was pointed out by Vogel V12), who first reported on the extremely high electrical conductivity of graphite-SbFj measured normal to the crystallographic c-axis. The measured conductivity was approximately 40 times that of pristine graphite, and 50% greater than that of pure copper. Other workers... [Pg.309]

There is no question that the development and commercialization of lithium ion batteries in recent years is one of the most important successes of modem electrochemistiy. Recent commercial systems for power sources show high energy density, improved rate capabilities and extended cycle life. The major components in most of the commercial Li-ion batteries are graphite electrodes, LiCo02 cathodes and electrolyte solutions based on mixtures of alkyl carbonate solvents, and LiPF6 as the salt.1 The electrodes for these batteries always have a composite structure that includes a metallic current collector (usually copper or aluminum foil/grid for the anode and cathode, respectively), the active mass comprises micrometric size particles and a polymeric binder. [Pg.216]

Fig. 1. Typical a.c. plasma systems used for hydrogenation of semiconductor samples. A. In this aparatus, hydrogen is pumped through the quartz tube (Q) and a plasma excited by inductive coupling of 13.56 MHz r.f. power with a copper coil (c2). The sample rests on a graphite block (b) that is heated by 440 KHz power coupled by a second coil (cl). A pyrometer (P) measures the sample temperature. B. In this system, a high frequency oscillator is used for plasma excitation while the sample is heated in a tube furnace (Pearton et al., 1987). Fig. 1. Typical a.c. plasma systems used for hydrogenation of semiconductor samples. A. In this aparatus, hydrogen is pumped through the quartz tube (Q) and a plasma excited by inductive coupling of 13.56 MHz r.f. power with a copper coil (c2). The sample rests on a graphite block (b) that is heated by 440 KHz power coupled by a second coil (cl). A pyrometer (P) measures the sample temperature. B. In this system, a high frequency oscillator is used for plasma excitation while the sample is heated in a tube furnace (Pearton et al., 1987).
In practice, a mixture of actinide dioxide and graphite powder is first pelletized and then heated to 2275 K in vacuum in a graphite crucible until a drop in the system pressure indicates the end of CO evolution. The resulting actinide carbide is then mixed with tantalum powder, and the mixture is pressed into pellets. The reduction occurs in a tantalum crucible under vacuum. At the reduction temperature, the actinide metal is vaporized and deposited on a tantalum or water-cooled copper condenser. [Pg.9]

Figure 1.6 Simple benchtop reactor developed by WudI [27]. Helium supply and connection to a vacuum system (A), Pyrex bell jar (B), graphite rod (3 mm) (Q, graphite rod (12 mm) (D), copper electrode (E), manometer (F). Figure 1.6 Simple benchtop reactor developed by WudI [27]. Helium supply and connection to a vacuum system (A), Pyrex bell jar (B), graphite rod (3 mm) (Q, graphite rod (12 mm) (D), copper electrode (E), manometer (F).

See other pages where Copper/graphite systems is mentioned: [Pg.523]    [Pg.523]    [Pg.599]    [Pg.53]    [Pg.261]    [Pg.96]    [Pg.275]    [Pg.17]    [Pg.567]    [Pg.723]    [Pg.153]    [Pg.67]    [Pg.384]    [Pg.311]    [Pg.403]    [Pg.515]    [Pg.299]    [Pg.324]    [Pg.60]    [Pg.419]    [Pg.226]    [Pg.233]    [Pg.285]    [Pg.69]    [Pg.71]    [Pg.6]    [Pg.41]    [Pg.840]    [Pg.403]    [Pg.384]    [Pg.75]    [Pg.713]    [Pg.178]    [Pg.272]    [Pg.148]    [Pg.123]    [Pg.193]    [Pg.311]    [Pg.106]    [Pg.66]    [Pg.150]    [Pg.273]   
See also in sourсe #XX -- [ Pg.251 ]




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Copper systems

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