Contaminants microelectronics industry

Perfluoropolyethers emerged on the market in the early 1970s. The first perfluoropolyether was the homopolymer of hexafluoropropylene oxide produced by DuPont, which has the structure [—CF2CF(CF3)0—] and this new lubricant material was called Krytox.31,32 Krytox was and is used in most of the vacuum pumps and diffusion oil pumps for the microelectronics industry because it does not produce any hydrocarbon or fluorocarbon vapor contamination. It also has important applications in the lubrication of computer tapes and in other data processing as well as military and space applications. 

CF4 is widely used as a feed gas for plasma etching in the microelectronic industry dissociative electron collisions ultimately determine the constituents in the fragmentation of the parent molecule, producing the neutral etch-active species F and heavier molecular fragments which may cause surface damage and contamination. The electron impact dissociative ionization of CF4 has therefore been investigated thoroughly71. 

Thin films are used for a variety of applications In the microelectronics Industry. As the technology has advanced, the control of contaminants, thicknesses, and Interfaces of thin films has become more critical. Following deposition of multicomponent structures, further processing or thermal stress after packaging may result In a redistribution of the... 

Sixxx Banan micn robe (BMP) spectra are identical to spectra acquired in a classical (macro) gecmtetry, literature spectra and lectral files can be used for interpretation, llcations in the microelectronics industry Include fingerprint Ideitlficatlon of microscale contaminants and inclusions/ and characterization of technologically inportant new materials. 

FIGURE 13.3. The absence of aerosol particles (dust or liquid) is especially important in the microelectronics industry. The presence of dust or liquid contaminants on the surface of virgin semiconductor (a) will lead to coating defects in the preparation of the microdrcuits (Z>) and defects in the final product (c). 

The advantage of CVP, apart from the elimination of solvent induced contamination and oxidative defects, is that it is compatible with traditional inorganic semiconductor processes in the microelectronic and optoelectronic industry. This would be extremely important in the integration of polymer and inorganic semiconductors into hybrid devices with a minimum of processing steps. Moreover, CVP allows the mixture of monomeric compounds in any ratio, thus facilitating the deposition of graded films. 

Aerosol science plays a key role in many different fields including (a) atmospheric sciences and air pollution, (b) Industrial production of pigments, fillers, and specially metal powders, (c) fabrication of optical fibers, (d) industrial hygiene, and (e) contamination control in the microelectronics and pharmaceuticals industries. Aerosols present in such applications can usually he considered as desirable or undesirable, but the same basic concepts apply to both types. Specialist. in the various applied fields increasingly make use of similar theoretical concepts and experimental techniques in solving aerosol problems. These common approaches are the focus of this book. 

A. Christou, Reliability Aspects of Moisture and Ionic Contamination Diffusion Through Hybrid Encapsulants, in Proceedings of the Technical Program—International Microelectronics Conference (1978) p. 237, Industrial Scientific Conference Management, Inc., New York. Electric insulators and dielectrics Silicone/epoxy-polyurethane interpenetrating networks, moisture, and ion diffusion through potting compounds. 

Surface Anatysis. Surface analysis can be employed in many situations, but it is particularly well suited for the analysis of contamination or surface damage. In many industries, contamination at the nanometer scale can spell disaster for a process. For example, semiconductor materials have very predictable conductive behavior, which is essential for designing microelectronics that work properly. The addition of contaminants to the system will change the behavior of the materials and can cause failures, so it is essential that surface analysis be employed in the development of a product and sometimes during manufacturing stages to ensure that the materials are clean and reliable. 

Leygraf, in the chapter on atmospheric corrosion, discusses the environmental differences between indoor and outdoor exposure conditions and why these differences are important to corrosion of electronics. Although the service environments for electronic devices are typically less severe than for many other types of equipment, industrial atmospheres do contain harmful oxidizing (e.g., Clj, SO2, NO ) and halide-containing (e.g., NaCl) species that can diffuse or migrate to microelectronic metallization, especially over an extended service life. Because of the importance of contamination control, techniques to quantify microscopic levels on have been developed [30,44],... 

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