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Combustion chemical vapour deposition

This is an innovative CVD technique developed at the Georgia Institute of Technology in 1995. Combustion chemical vapour deposition (C-CVD) is a special [Pg.120]

The parameters affecting the properties and microstructure of the coating in the C-CVD are (1) the solution types and their composition (2) precursor concentration in the solvent (3) flow rate of the mixture of solution and the oxidising gas as well as the flow rate of the oxidising gas (4) the temperature and [Pg.121]


Shoup SS, Shanmugham S, Cousins D, Hunt AT (1999) Low-cost combustion chemical vapour deposition of epitaxial buffer layers and superconductor. IEEE Trans on Appl Superconductiv 9 2426-2429... [Pg.128]

Hunt, Carter and Cochran (1993) developed a new deposition method that utilised the combustion of liquid or gaseous precursors in a combustion flame (combustion chemical vapour deposition, CCVD). Trommer etal. (2007) applied this technique to deposit hydroxyapatite coatings onto austenitic 316L stainless steel substrate surfaces. The equipment used is shown schematically in Figure 5.49. [Pg.224]

Hunt, A.T., Carter, W.B., and Cochran, J.K. (1993) Combustion chemical vapour deposition a novel thin-film deposition technique. Appl. Phys. Lett., 63 (2), 266. [Pg.237]

Fundamental studies of gas-phase ionic processes are also of interest in other areas, including combustion, the chemistry of the ionosphere, interstellar chemistry and chemical vapour deposition. Another important aspect of gas-phase studies is that they probe the intrinsic reactivity of ionic species in the absence of counter ions and solvent. Indeed, in cases where sufficient data are available, comparisons between solution- and gas-phase studies provide insights into solvent and counter ion effects. ... [Pg.733]

The techniques discussed here in connection with combustion diagnostics can clearly also be used for the monitoring of other reactive media. The techniques have been found to be valuable in the characterization of chemical vapour deposition (CVD) processes for semiconductor fabrication [10. 47]. The examples mentioned here illustrate the power of laser spectroscopic techniques in studying chemical processes. Numerous other examples of chemical applications of laser spectroscopy can be found. The field was covered in [10.48,2]. [Pg.315]


See other pages where Combustion chemical vapour deposition is mentioned: [Pg.120]    [Pg.485]    [Pg.120]    [Pg.485]    [Pg.76]    [Pg.188]    [Pg.349]    [Pg.341]    [Pg.238]    [Pg.91]    [Pg.387]    [Pg.387]    [Pg.941]    [Pg.209]    [Pg.441]    [Pg.348]    [Pg.258]    [Pg.53]   


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Combustible chemical

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