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Chemical vapour deposition method

An MWCNT has inner concentric tube(s) with smaller diameter(s) inside its hollow, and it is normally prepared in the carbon electrode of the arc-discharging method or by chemical vapour deposition method (see Chaps. 2 and 12). Influence of such inner tubes on the most outer layer in MWCNT is of interest with respect to electronic similarity of MWCNT and SWCNT. [Pg.47]

TABLE 4 Chemical Vapour Deposition Methods and Their Key Features... [Pg.1302]

The chemical vapour deposition method is based on the chemical vapour deposition of a carbon layer on top of a ceramic support. [Pg.42]

Then Araki et al. [37] synthesized the silica membrane by chemical vapour deposition method on alumina support. They used commercial Pt catalysts for WGS reaction. Increase in reaction temperature from 525 to 575 K increases the... [Pg.154]

Kashima T, Matsuda Y, Fujiyama H (1991) Development of the quadrupole plasma chemical vapour deposition method for low temperature, high speed coating on an optical fibre. Mater Sci Eng A 139 79-84 Kaya C, He JY, Gu X, Butler EG (2002) Nanostructured ceramic powders by hydrothermal synthesis and their applications. Microporous Mesoporous Mater 54 37-49... [Pg.429]

Singh, C., Shaffer, M.S., Windle, A.H. Production of controlled architectures of aligned carbon nanotubes by an injection chemical vapour deposition method. Carbon 41(2), 359-368(2003)... [Pg.60]

Takahashi, T, Tanaka, S. and Esashi, M. (2006) Development of an in situ chemical vapour deposition method for an alumina catalyst bed in suspended membrane micro fuel reformer. J. Micromech. Microeng., 16, 206-210. [Pg.380]

The nanocomposite component used to modify the poly(l-lactide/dl-lactide) (PLDL) precursor was multi-walled carbon nanotubes (MWCNTs) obtained by the chemical vapour deposition method (CVD) (provided by NanoAmor, USA). The MWCNTs had diameters in the range of 10-30nm and were l-2pm long (Fig. 1A,B). The specific surface area (SSA) of the MWCNTs was about... [Pg.246]

Taschner, C. Leonhardt, A. Schonherr, M. Wolf, E. Henke, J. (1991). Structure and Properties of TiC Layers Prepared by Plasma-Assisted Chemical Vapour Deposition Methods. Mater, Sci Eng, A, Vol. 139, pp. 67-70 Thery, J. Martin, S. Faucheux, V. Le Van Jodin, L. Truffier-Boutry, D. Martinent, A. Laurent, J.Y. (2010). Fluorinated Carboxylic Membranes Deposited by Plasma Enhanced Chemical Vapour deposition for Fuel Cell Applications. /, Power Sources, Vol. 195, pp. 5573-5580... [Pg.137]

An example of this process of data analysis is provided by the work of Yubero et al. (2000), who studied the structure of iron oxide thin films prepared at room temperature by ion beam induced chemical vapour deposition. Such films find important applications because of their optical, magnetic, or magneto-optical properties. They were produced by bombardment of a substrate with Oj or Oj + Ar+ mixtures, and Figure 4.15 shows RBS spectra of two iron oxide thin films prepared on a Si substrate by each of these bombardment methods. [Pg.94]

Incorporation of nitrogen into the carbons prepared via chemical vapour deposition (CVD) or into the carbon nanotubes yields highly graphitised materials with excellent structure ordering. For example, ordered mesoporous carbons containing 7.0-8.8 wt,% N have been obtained by the CVD method, using the SBA-12, SBA-15, MCM-41, MCM-48, and HMS materials as matrices and acetonitrile as carbon precursor [1],... [Pg.193]

Synthesis of intermetallics can be performed from their constituents involving the gas phase by using various methods. Notice that the presence of the gas phase may be relevant in several kinds of synthesis. A special role, however, is played by the gas phase in some groups of interrelated methods, which are generally defined as physical vapour deposition, chemical vapour deposition, vapour phase transport. [Pg.582]

In a review by Gonsalves el al. (2000), techniques for the fabrication of nano-structured materials are outlined. Synthesis from corresponding organo-metal precursors of nano-structured metals (Fe, Co, Ni) and alloys (Fe-Co, Pt-Pd, and special steels) are discussed and various methods considered such as thermal decomposition, ultrasonic irradiation, chemical vapour deposition, laser pyrolysis and reduction. [Pg.596]

Chemical Vapour Deposition (PECVD). It is expected that these amorphous silicon foils could be processed at low costs using the processing methods adopted for films. [Pg.114]

The chemical vapour deposition (CVD) technique can be regarded as an extension of the sublimation method used for the preparation of single crystals discussed before, but adapted to thin him growth implying deposihon on substrates. A schematic diagram of a horizontal hot-wall CVD apparatus is shown in Fig. 3.15. [Pg.125]

Optical fibres need to be free of impurities such as transition metal ions (see Chapter 8) and conventional methods of preparing silica glasses are inadequate. The sol-gel process is one way of forming fibres of sufficient purity (chemical vapour deposition. Section 3.7, is another). These processes use volatile compounds of silicon which are more easily purified, for example by fractional distillation, than silica. It is possible to produce silica fibres using a method similar to that studied in the nineteenth century, but with the geldrying time reduced from a year to a few days. Liquid silicon alkoxide (Si(OR)4), where R is methyl, ethyl, or propyl, is hydrolysed by mixing with water. [Pg.156]

Two different methods were used to selectively reduce the surface activity of Y zeolites i) the action of a steric hindered base such as phenan-thridine and ii) the chemical vapour deposition of alkoxysilane (ref. 20). [Pg.575]

There are two ways in which coatings can be applied thermomechanical processes (e.g. detonation gun, flame spraying and plasma spraying) and vapour phase deposition processes. The latter category can be subdivided into CVD (chemical vapour deposition) and PVD (physical vapour deposition). In the case of a CVD process, a chemical reaction takes place in an oven and as a result the coating material is formed and deposited on the object. Figures 11.7.9 and 11.7.10 are representations of two methods to apply coatings. [Pg.294]

Other methods make use of CVD (Chemical Vapour Deposition), the precipitation or deposition of vapours on a surface. In this process... [Pg.345]


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Classification of the Chemical Vapour Deposition Methods

Vapour deposition methods

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