Al substrates

Sensilizdiioii of the phomrcceptor. The photoreceptor consists of a vacuum-deposited film of amorphous Se, 50 pm thick, on an Al substrate this is sensitized by electrostatic charging from a corona discharge using a field of lO Vcm . ... 

Schwartz, S.H. et al.. Substrate specificity and kinetics for VP14, a carotenoid cleavage dioxygenase in the ABA biosynthetic pathway, Biochim. Biophys. Acta 1619, 9, 2003. 

Walker, D., et al. Substrate upregula-tion of the human small intestinal peptide transporter, hPepTl. J. Physiol. 1998, 507, 697-706. 

Meier, P. J., et al. Substrate specificity of sinusoidal bile acid and organic anion uptake systems in rat and human liver. Hepatology 1997, 26, 1667-1677. 

Kramer, W., et al. Substrate specificity of the ileal and the hepatic Na(+)/bile acid cotransporters of the rabbit. I. Transport studies with membrane vesicles and cell lines expressing the cloned transporters. J. Lipid Res. 1999, 40, 1604-1617. 

Due to re- and si-coordination of prochir-al substrates at a catalyst with C2-sym-metric chiral ligands two diastereomeric catalyst-substrate complexes emerge. In the case of C,-symmetric ligands already four stereoisomer intermediates result. 

Darbyshire JF, Iyer KR, Grogan J, et al. Substrate probe for the mechanism of aromatic hydroxylation catalyzed by cytochrome P450. Drug Metab Dispos 1996 24(9) 1038-1045. 

On the other hand, the oxidized products in LiPF4 and LiBF4 electrolytes could consist of less soluble species such as AIF3 and Al2(C03)3, as suggested by AmlAQ = 26—27, indicating negligible desorption from the Al surface and therefore less corrosion of the Al substrate. 

Figure 6. Calculated absorbed energy density due to forward and backward scattered electrons. Zq is the penetration depth in a 0.4-nm PMMA film which is coated on an Al substrate. The electron energy used is 20 keV. (Reproduced with permission from Ref. 4j...

Also shown in Fig. 2 are the measured spectrum of a TEOS (tetra-ethyl-ortho-silicate)-TiN-Al stack, overlaid with the theoretical spectrum. The theoretical spectrum was based on such substrate modeling treatment. Given this empirical spectrum, both the TiN and TEOS thicknesses can be simulated and determined simultaneously. Alternatively, the TiN thickness can be fixed with only the TEOS needing to be measured. The latter method is better than the former because the more unknown film thicknesses there are, the more error is introduced. This can be demonstrated by the data in Table I, where the measurement results of the oxide thicknesses on TiN-Al substrates on the same wafer, for TiN thickness fixed and varying, are compared. 

Comparison of Oxide Thickness Measurement on TiN/Al Substrate with the TiN Thickness Fixed and as a Variable in the Response Spectra Simulation... 

Der letztere Mechanismus wiirde bedeuten, daB Deuterium in das Molekiil (57) inkorporiert werden miiBte, wenn die Reaktion in Aceton-de als Substrat ausgefiihrt wiirde. Dies ist aber nicht der Fall 43), folg-lich scheint der Verlauf nach 1. korrekt zu sein. 

Setzt man Arylazo-1,3-dihydroxy-benzole als Substrate ein, wird zunachst die zur Azo-Gruppe pura-standige Hydroxy-Gruppe ausgetauscht erst bei langerem Erwarmen tritt Substitution der zweiten Hydroxy-Gruppe ein ... 

Der Katalysator wird im Fall von 2-Methyl-propanal als Substrat mit WasserstofFaktiviert, im Fall von Butanal mit Natrium-boranat und Wasserstoff. 

An advantage of aluminum is the high level of knowledge and the automated production plants stemming from the mass production of Al substrates for magnetic hard disks these can be widely used for the production of substrate disks for optical data storage. 

Another disadvantage of Al substrates is their higher weight compared to polymer substrates, and particulady the significantly higher production costs of the disks themselves. 

Fur die Reaktivitat spezieller Komplexverbindungen als Hydrierungskatalysatoren wurde mit 1-Hepten als Substrat die folgende Abstufung gefunden ... 

Melet A, Assrir N, Jean P, et al. Substrate selectivity of human cytochrome P450 2C9 importance of residues 476, 365, and 114 in recognition of diclofenac and sulfaphenazole and in mechanism-based inactivation by tienilic acid. Arch Biochem Biophys 2003 409 80-91. 

Stresser DM, Blanchard AP, Turner SD, et al. Substrate-dependent modulation of CYP3A4 catalytic activity analysis of 27 test compounds with four fluorometric substrates. Drug Metab Dispos 2000 28 1440-1448. 

DeVoss JJ, Sibbesen O, Zhang ZP, et al. Substrate docking algorithms and prediction of the substrate specificity of cytochrome P450(cam) and its L244A mutant. J Am Chem Soc 1997 119 5489-5498. 

The chemical structure and composition of films deposited onto the Al substrates was determined by X-ray photoelectron spectroscopy (XPS) using a Perkin Elmer PHI 548 instrument. Measurement of advancing and receding water contact angles (aa and or, to 3°) were carried out by the sessile drop technique, using a Rame Hart contact angle goniometer (10 ). 

Bei der Oxidation des Substrates treten in der Regel radikalische Substrat-Zwi-schenprodukte auf. Im Falle der Bildung der PXDD und PXDF durch Oxidation von halogenierten Phenolen als Substrate wird das Entstehen von halogenierten Phenoxy-Radikalen als reaktive Zwischenstufen angenommen (Abb. 4-9). 

Generation layers have recently been prepared from aqueous dispersions. Hoshino et al. (1991) described the cathodic deposition of various phthalo-cyanines and perylenes from aqueous dispersions containing poly(oxyethylene dodecyl ether) and LiBr. The pigment-polymer aggregate was plated onto an Al cathode. The layer was then coated with a transport layer using conventional solvent coating techniques. Hiruta et al. (1991) described a related technique as thermoinduced deposition. Aqueous phthalocyanine dispersions, as described above, were found to adsorb on an Al substrate at 90 C. 

Before film deposition, several Al substrates were annealed in air at 590°C for two hours. Under these conditions, a 40 nm thick thermally grown Al Oj is formed. With these substrates also coated with SijN films (system B) and SiO 4.5 wt.% P films (system E), the aim is to compare the mechanical behavior of systems with a native oxide interlayer (systems A and C) to that of systems having a thermally grown Al Oj interlayer (systems B and E). 

Finally, before the deposition of the SiO 4.5 wt.% P film, the surface of an Al substrate was intentionally scratched by mechanical polishing. The scratches were about 1.5 pm wide, 1 pm deep, and were oriented 45° with respect to the longitudinal axis of the sample. This system (denoted as D), permits analysis of the effect of an interfacial roughness. 

Fig. 7 Sequential micrographs of the evolution of the damage in a SiO 4.5 wt.% P film deposited on an Al substrate subjected to a tensile test (system C, Figure 6). The black arrows show the tensile direction, (a) Networks of primary and secondary cracks perpendicular to the tensile axis (e = 11%). The white arrows show a secondary crack which stops when getting close to primary cracks, (b) decohesion and buckling of the strips of film. Slip lines are observed on the Al surface under the buckled strips, and (c) transverse rupture of the buckled zones along the directions of maximum shear of the substrate (e = 19%).

Fig. 8 Detailed views of decohesion and buckling among a cracked SiO 4.5 wt.% P film deposited on a scratched Al substrate. The white arrows show the scratches. The buckled strips of the film are perpendicular to the tensile direction.

Jacobs CL, Goon S, Yarema KJ, Hinderlich S, Hang HC, Chai DH, et al. Substrate specificity of the sialic acid biosynthetic pathway. Biochemistry 2001 40 12864-12874. 

Das ESR-Spektrum der Radikale, die bei pH 1 im TP+ZNH2OH-Redoxsystem mit AUylamin als Substrat beobachtet werden, ist dem Radikal NH2-CHg-CH-CH2-NH2 zuzuordnen (770). 

Cosse et al. showed that EF decreases as the thickness of anodized Al-0.5%Cu films increases from 3 to 10 J.m.32 Kikuchi et al. reported that EMM of Al specimens resulted in the hemispherical 20-pm-deep microgrooves.40 In this case, porous-type anodization of patterned Al substrates was isotropic. These results suggest that localized anodization becomes isotropic as the anodization process proceeds. These conclusions are consistent with those obtained with other EMM methods, which indicate that EF decreases as the depth of metal removal increases.13,17... 

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