UV processors

Modern flexographic folding carton press with three UV processors. (Courtesy of Prime UV-IR.) 

Dry offsef is used to decorate drawn and ironed mefal cans, round plastic fubs, and plastic or mefal collapsible fubes. ° 

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In summary, one of the most important factors in the success of a UV curing operation is in the correct choice of the lamp system. The interested reader is referred to an excellent book recently written by Roger Phillips (24) for a review of the light sources available for UV curing. Scrutinization of the information provided in this well-written and detailed treatise could well save either the experienced or novice UV processor a good deal of time and money. 

AM 8, and AM 9 were evaluated in an overprint varnish formulation for high speed litho applications. The viscosities of the formulations were measured with a Brookfield RVT viscometer. Curing was done with an RPC UV processor with two 200 watt/inch medium pressure Hg vapor lamps or with a Fusion Systems processor with one 300 watt/inch H bulb. 

The deep UV absorption characteristics of these catalysts requires deep UV lamp sources for optimum cure. All of the cure results presented herein were therefore obtained with an RPC Model 1202 QC Lab UV Processor equipped with 2 Hanovla medium pressure mercury vapor ultraviolet sources each capable of Independent operation at 100, 200 or 300 watt/lnch nominal power output and a conveyor which operates between 10 and 500 fpm. Actual power flux can therefore be widely varied per pass through the Processor as a function of total lamp output and conveyor speed. We have found that the microwave-fired Fusion Systems H lamp is also well-suited for these iodonlum/epoxysiloxane systems. 

PLA film was prepared by melt extrusion process with a nominal film thickness of 30 ocm. A PLA film specimen (5 cm x 5 cm) was prepared for UV irradiation, were a UV processor (Model No. 60000 Oriel Corporation) was used. The processor was equipped with a 100-W mercury arc lamp (Model No. 8261 Oriel Corporation) having a wavelength range of 232-500 nm and intensity of 25 mW/cm at 365 nm. 

Fig. 2. Schematic of the RISTON dry film photoresist process, (a) Removal of polyolefin separator sheet and laminate resist to clean surface, using special laminator (b) exposure to uv source using positive or negative phototool (positive to plate negative for print-and-etch) (c) removal of the protective Mylar, which is readily removed by hand and (d) development using a special processor (3).

T0831 U.S. Waste Thermal Processing, Model 100 Mobile Thermal Processor T0833 Ultraviolet Oxidation (UV/Oxidation)—General T0834 Ultrox Intemational/U.S. Filter, ULTROX Advanced Oxidation Process T0838 United Retek Corporation, Asphalt Emulsion Stabilization... 

Within the front-end processor is an integrator that will integrate the output of the log-ratio-amplifier over the period between the beginning and end-of-scan pulses. This is the equivalent of total ion current in GC/MS the value in LC/UV,VIS is termed a total absorption chromatogram or TAC. 

Narrow band filters 410,5 and 4S0,5 nrn Xenon [UV light source 60286 computer OT-2861 frame grabber OE-7020 array processor... 

As expected, the more intense the light source, the faster the photocure. Cures in as short as 30 seconds have been obtained on a PPG Ultraviolet Processor. However, with this polymer system, UV radiation alone is not sufficient for fast cure rates. Both heat and light are required. This is demonstrated in Table IV. 

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