UV photolithography

FIGURE 10.4 Microphotograph of the pH ISFET with an on-chip pH meter. The whole device was coated with SU-8 photoresist using standard UV photolithography, leaving a 500 pm square well as the ISFET opening. (Reproduced from [85], with permission from Elsevier.)... 

Fig. 6.2. Patterning of positive (a) and negative (b) photoresists using UV-photolithography.

As it was mentioned earlier, a much larger range of micro/nanofabrication tools are utilized in the design and fabrication of micro/nanotransducers than applied in the fabrication of microfluidic systems. Standard photolithography as described above is only one of the many techniques used. Three examples will be described here the fabrication of freestanding transducers, UV-photolithography with lift-off technique for preparation of interdigitated ultramicroelectrode arrays (IDUAs), and more traditional techniques for microtransducer preparations. 

Recent progress has been made in microelectronic device fabrication, particularly in microlithography used to manufacture the high-resolution circuit elements of integrated circuit (Ref. 96). Deep-UV photolithography based on chemically amplified resist is likely to be the first technology that met the severe performance criteria required. The best known chemically amplified resist is based on poly (4-t-butoxycarbonyloxy styrene) or copolymers (Ref. 97). 

In this session, micro direct methanol fuel cells (DMFC) fabricated by Si MEMS and plastic MEMS are described. For examples of micro/nano fabrication technologies, fine micro plastic fluidic chips fabricated by molding and low temperature bonding are reported. The 3-D metal micro mesh electrode fabricated by simple UV photolithography is described next. For an example of micro flow devices, the pneumatically actuated microvalve and the microreactor having multireagent inlets are introduced. 

Deep UV Photolithography with Composite Photoresists Made of Poly(olefin sulfones)... 

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