Unique materials deposition

In most cases, CVD reactions are activated thermally, but in some cases, notably in exothermic chemical transport reactions, the substrate temperature is held below that of the feed material to obtain deposition. Other means of activation are available (7), eg, deposition at lower substrate temperatures is obtained by electric-discharge plasma activation. In some cases, unique materials are produced by plasma-assisted CVD (PACVD), such as amorphous siHcon from silane where 10—35 mol % hydrogen remains bonded in the soHd deposit. Except for the problem of large amounts of energy consumption in its formation, this material is of interest for thin-film solar cells. Passivating films of Si02 or Si02 Si N deposited by PACVD are of interest in the semiconductor industry (see Semiconductors). 

Thin films formed by atomistic deposition techniques are unique materials that seldom have handbook properties. Properties of these thin films depend on several factors (4), including substrate surface condition, the deposition process used, details of the deposition process and system geometry, details of film growth on the substrate surface, and post-deposition processing and reactions. For some appHcations, such as wear resistance, the mechanical properties of the substrate is important to the functionaHty of the thin film. In order to have reproducible film properties, each of these factors must be controUed. 

The dissociation of gas molecules in a plasma involves the formation of intermediate, highly reactive fragments, which are very unstable under normal circumstances. Therefore, PECVD allows the deposition of quite unique materials with very unusual properties. 

Bonkovsky HL, Blanchette PL, Schned AR. Severe liver injury due to phenelzine with unique hepatic deposition of extracellular material. Am J Med 1986 80(4) 689-92. 

Another prediction of the model is that the size and number of particles are uniquely determined by the total amount of material deposited, irrespective of conditions, provided complete condensation is operative. This can be readily appreciated by noting that, in Equations (9) and (10), time appears only in conjunction with rate so that Vt (the quantity deposited) is the effective independent variable. This prediction has been verified through experiments in which rate and temperature were varied for a given specimen. The deposit morphology depended only on how much material was deposited and was insensitive to the way in which it was done. 

Parylene is a unique CVD deposited insulating pol3uner, first discovered in 1947 [52]. The material is supplied as a metastable dimer first described by [53]. The dimer is sublimed under vacuum and flows into a hot wall furnace where it is cracked into a pair of direactive monomer units. These then flow by diffusion into the deposition chamber, which is near or below room temperature, and condense into a high molecular weight polymer. The polymer is fully reacted without the need for any post-processing. 

A unique feature of in situ encapsulation technology is that polymerization occurs ia the aqueous phase thereby produciag a condensation product that deposits on the surface of the dispersed core material where polymerization continues. This ultimately produces a water-iasoluble, highly cross-linked polymer capsule shell. The polymerization chemistry occurs entirely on the aqueous phase side of the iaterface, so reactive agents do not have to be dissolved ia the core material. The process has been commercialized and produces a range of commercial capsules. 

Numerous theories exist as to how the Chilean deposits formed and survived. It has been postulated that the unique nitrate-rich caUche deposits of northern Chile owe their existence to an environment favorable to accumulation and preservation of the deposits, rather than to any unusual source of the saline materials (2). The essential conditions are an extremely arid climate similar to that of the Atacama desert in the 1990s, slow accumulation during the late Tertiary and Quaternary periods, and a paucity of nitrate-utilizing plants and soil microorganisms. 

Substituting one alloy for another may be the only viable solution to a specific corrosion problem. However, caution should be exercised this is especially true in a cooling water environment containing deposits. Concentration cell corrosion is insidious. Corrosion-resistant materials in oxidizing environments such as stainless steels can be severely pitted when surfaces are shielded by deposits. Each deposit is unique, and nature can be perverse. Thus, replacement materials ideally should be tested in the specific service environment before substitution is accepted. 

These processes are very rapid and allow the preparation of inorganic supports in one step. This technique allows large-scale manufacturing of supports such as titania, fumed silica, and aluminas. Sometimes the properties of the material differ from the conventional preparation routes and make this approach unique. Multicomponent systems can be also prepared, either by multimetallic solutions or by using a two-nozzle system fed with monometallic solutions [22]. The as-prepared powder can be directly deposited onto substrates, and the process is termed combustion chemical vapor deposition [23]. 

In this chapter the potential of nanostructured metal systems in catalysis and the production of fine chemicals has been underlined. The crucial role of particle size in determining the activity and selectivity of the catalytic systems has been pointed out several examples of important reactions have been presented and the reaction conditions also described. Metal Vapor Synthesis has proved to be a powerful tool for the generation of catalytically active microclusters SMA and nanoparticles. SMA are unique homogeneous catalytic precursors and they can be very convenient starting materials for the gentle deposition of catalytically active metal nanoparticles of controlled size. 

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