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Two photon lithography

Wn ES, Strickler JH, Harrell WR, Webb WW (1992) Two-photon lithography for microelectronic application. SPIE Proc 1674 776-782... [Pg.202]

Juodkazis S, Mizeikis V, Seet KK, Miwa M, Misawa H (2005) Two-photon lithography of nanorods in SU-8 photoresist. Nanotechnol 16 846-849... [Pg.206]

C. K. (2004) Preparation and two-photon lithography of a sulfur containing resin with high refractive index. J. Photopol. Sc. Tech., 17 (1), 115-118. [Pg.137]

Jeon, S., Malyarchuk, V., Rogers, J.A., and Wiederrecht, G.P. (2006) Fabricating three dimensional nanostructures using two photon lithography in a single exposure step. Opt. Express, 14 (6), 2300-2308. [Pg.140]

J.H. Atwater, P. Spinelli, E. Kosten, J. Parsons, C. Van Lare, J. Van De Groep, J. Garcia De Abajo, A. Polman, H.A. Atwater, Microphotonic parabolic light directors fabricated by two-photon lithography. Appl. Phys. Lett. 99(15) 151113 (2011)... [Pg.240]

The field of laser lithography (also often called laser microfabrication) branched out from multiphoton excitation microscopy and has become established during the last decade. The principles of two-photon microscopy, which has enabled high-resolution 3D imaging [3,4] and optical memory [5], were gradually adapted for 3D laser hthography [6]. A relevant collection of seminal papers on the field can be found in [7]. [Pg.160]

Fig. 15 Schematic implementation of quantum lithography with photon pairs generated in SPDC. Two-photon absorbing photoresist is used as a recording medium. SPDC signal and idler photons are overlapped on a beamsplitter, and exit either of its output ports together. Exposure patterns due to classical and quantum interference are shown in the long and short amplitudes, respectively... Fig. 15 Schematic implementation of quantum lithography with photon pairs generated in SPDC. Two-photon absorbing photoresist is used as a recording medium. SPDC signal and idler photons are overlapped on a beamsplitter, and exit either of its output ports together. Exposure patterns due to classical and quantum interference are shown in the long and short amplitudes, respectively...
The original proposal of quantiun lithography [68] considered exposure of a two-photon absorbing material to two beams of path-entangled photons (e.g., those in the output ports of the beamsplitter), overlapping in space with mutual angle 9. It is helpful to recall that overlap between two classical... [Pg.183]

MiwaM, Juodkazis S, KawakamiT, Matsuo S, Misawa H (2001) Femtosecond two-photon stereo-lithography. Appl Phys A 73 (5) 561-566... [Pg.205]

D Angelo M, Chekhova MV, Shih Y (2001) Two-photon diffraction and qnantinn lithography. Phys Rev Lett 87 13602... [Pg.205]

Perry JW, Ananthavel S, Carmmack K, Kuebler SM, Marder SR, Rumi M, Cumpston BH, Heikal AA, Ehrlich JE, Erskine LL, Levin MD (1999) Materials for two-photon 3D lithography. In Organic thin films for photonics applications. Optical Society of America, Washington DC,p 174... [Pg.86]

Keywords 3D lithography Two-photon photopolymerization Femtosecond laser Micro-nanodevice Micro-nanofabrication... [Pg.171]

In two-photon 3D lithography, the nominal Gaussian output of the laser underwent beam expansion and focusing, and was spatially filtered, producing a relatively flat wave front. Light distribution at the focal plane arises essentially from Fraunhoffer diffraction on the aperture of an objective lens [126], of which the diffraction pattern is shown by the inset of Fig. 18. [Pg.210]

Park, J. D. Lee, K. D. 2007. Method for manufacturing stamp for nanoimprint lithography having two-dimensional pattern of uniform size and shape, and method for photonic crystal using the same. LG Electronics Inc., S. Korea. [Pg.467]


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See also in sourсe #XX -- [ Pg.3 , Pg.212 ]




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