Sulfur mustard chemical reactivity

The final type of chemical toxicity that will be presented are the vesicants, chemicals that cause blisters on the skin. There are two classes of blisters that implicate different mechanisms of vesication. Intraepidermal blisters are usually formed due to the loss of intercellular attachment caused by cytotoxicity or cell death. The second class occurs within the epidermal-dermal junction (EDJ) due to chemical-induced defects in the basement membrane components. The classic chemical associated with EDJ blisters is the chemical warfare agent sulfur mustard (bis-2-chloroethyl sulfide HD). HD is a bifunctional alkylating agent that is highly reactive with many biological macromolecules, especially those containing nucleophilic groups such as DNA and proteins. 

Methods for mustard destruction have been investigated for a long time [19, 20]. From the standpoint of chemical reactivity, one may consider decomposition by nucleophilic attack at a chlorine-bearing carbon atom as well as oxidation of the sulfur atom. Since mustard sulfoxide and sulfone are still potent vesicants, oxidation will be disregarded. Mustard decomposition via nucleophilic attack is as old as the use of mustard as a vesicant. 

Likewise polymeric nanofibers can also be used as a carrier for active chemistry that may allow for improvements in chemical protective properties. The nanofibers can provide a huge surface area to be functionalized with chemical groups that are reactive with toxic gases and chemicals. Graham et al. [39] mixed polyoxometal-late, a catalyst for the oxidative degradation of sulfur mustard (a chemical weapon agent) with the PU (Estane o R 58238) solution and electrospun the mixture into nanoflbers. The capabihty of the catalyst in the electrospun nanofiber was found to be even higher than the catalyst alone [39]. 

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