Successive ionic layer adsorption and reaction

Nicolau YF, Dupuy M, Brunei M (1990) ZnS, CdS, and Zni j Cdj S thin films deposited by the successive ionic layer adsorption and reaction process. J Electrochem Soc 137 2915-2924... [Pg.56]

Successive Ionic Layer Adsorption and Reaction (SILAR) and Related Sequential Solution-Phase Deposition Techniques... [Pg.239]

Nicolau, Y. F. 1985. Solution deposition on thin solid compound films by a successive ionic-layer adsorption and reaction process. Appl. Surf. Sci. 22-23 1061-1074. [Pg.270]

Pathan, H. M. Lockhande, C. D. 2004. Deposition of metal chalcogenide thin films by successive ionic layer adsorption and reaction (SILAR) method. Bull. Mater. Sci. 27 85-111. [Pg.270]

Lindroos, S. 1997. The successive ionic layer adsorption and reaction (SILAR) growth and characterization of ZnS and ZnS Mn thin films. Ph.D. thesis. University of Helsinki, Helsinki, Finland. [Pg.270]

Gao, X. D. Li, X. M. Yu, W. D. 2004. Morphology and optical properties of amorphous ZnS films deposited by ultrasonic-assisted successive ionic layer adsorption and reaction method. Thin Solid Films 468 43 17. [Pg.271]

Kanniainen, T. Lindroos, S. Prohaska, T. Friedbacher, G Leskela, M. Grasserbauer, M. Niinisto, L. 1995. Growth of zinc sulfide thin films with the successive ionic layer adsorption and reaction method as studied by atomic force microscopy./. Mater. Chem. 5 985-9. [Pg.271]

Valkonen, M. R Lindroos, S. Kanniainen, T. Leskela, M. Resch, R. Friedbacher, G Grasserbauer, M. 1998. Atomic force microscopy studies of ZnS films grown on (100) GaAs by the successive ionic layer adsorption and reaction method. J. Mater. Res. 13 1688-1692. [Pg.271]

Lindroos, S. Valkonen, M. Leskela, M. 1999. Growth of Zn02/Zn0 thin films by successive ionic layer adsorption and reaction—SILAR—technique. Adv. Sci. Technol. 20 43-50. [Pg.272]

Lindroos, S. Leskela, M. 2000. Growth of zinc peroxide (Zn02) and zinc oxide (ZnO) thin films by the successive ionic layer adsorption and reaction—SILAR— technique. Inter. J. Inorg. Mater. 2 197-201. [Pg.272]

Park, S. DiMasi, E. Kim, Y.-I. Han, W. Woodward, P. M. Vogt, T. 2002. The preparation and characterization of photocatalytically active Ti02 thin films and nanoparticles using successive-ionic-layer-adsorption-and-reaction. Thin Solid Films 515 1250-1254. [Pg.272]

Nicolau, Y. F. Menard, J. C. 1990. Procedure for solution growth of zinc sulfide, cadmium sulfide, and zinc cadmium sulfide (Zn xCdxS) thin films by successive ionic-layer adsorptions and reactions. J. Appl. Electrochem. 20 1063-1066. [Pg.274]

Sasagawa, M. Nosaka, Y. 2002. Electrochemical evaluation of the roles of chelating reagents in Cd ion adsorption on CdS surface for the successive ionic layer adsorption and reaction (SILAR) deposition. J. Electroanal. Chem. 536 141-144. [Pg.275]

Valkonen, M. P. Ritala, M. Lindroos, S. Leskela, M. 1998. Solid solution CdxZni xS thin films grown by atomic layer epitaxy and successive ionic layer adsorption and reaction techniques. Mater. Sci. Forum 287-288 367-370. [Pg.276]

Puiso, J. 2004. Growth kinetics and properties of lead sulfide thin films deposited on crystalline silicon using successive ionic layer adsorption and reaction method. Ph.D. thesis. Kaunas University of Technology, Kaunas, Lithuania. [Pg.276]

Nistorica, C. Liu, J.-F. Gory, I. Skidmore, G. D. Mantiziba, F. M. Gnade, B. E. Kim, J. 2005. Tribological and wear studies of coatings fabricated by atomic layer deposition and by successive ionic layer adsorption and reaction for micro-electromechanical devices. J. Vacuum Sci. Technol. A. 23 836-840. [Pg.278]

Electrodeposition is by its nature a condensed phase process, whereas most studies of ALE have been performed using gas phase or vacuum methodologies, CVD or MBE. A solution phase deposition methodology related to ALE has been developed in France by Nicolau et al. [27-32] (Fig. 2), in which adsorbed layers of elements are formed by rinsing a substrate in aqueous solutions containing ionic precursor for the desired elements, sequentially, in a cycle. After exposure to each precursor, the substrate is copiously rinsed and then transferred to a solution containing the precursor for the next element. The method is referred to as successive ionic layer adsorption and reaction (SILAR). Reactivity in SILAR appears to be controlled by the rinsing procedure, solution composition, pH, and specifically... [Pg.78]

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