Sequential solution-phase deposition

Successive Ionic Layer Adsorption and Reaction (SILAR) and Related Sequential Solution-Phase Deposition Techniques... 

SILAR AND RELATED SEQUENTIAL SOLUTION-PHASE DEPOSITION TECHNIQUES... 

TABLE 8.4. Films Grown by ILGAR, ECALE, and Other Sequential Solution-Phase Deposition Methods... 

Other Sequential Solution-Phase Deposition Techniques 270... 

Electrodeposition is by its nature a condensed phase process, whereas most studies of ALE have been performed using gas phase or vacuum methodologies, CVD or MBE. A solution phase deposition methodology related to ALE has been developed in France by Nicolau et al. [27-32] (Fig. 2), in which adsorbed layers of elements are formed by rinsing a substrate in aqueous solutions containing ionic precursor for the desired elements, sequentially, in a cycle. After exposure to each precursor, the substrate is copiously rinsed and then transferred to a solution containing the precursor for the next element. The method is referred to as successive ionic layer adsorption and reaction (SILAR). Reactivity in SILAR appears to be controlled by the rinsing procedure, solution composition, pH, and specifically... 

Impregnation is one of the most used techniques to incorporate an active phase in a support. It can also be used to deposit active phase to a monolith [85]. Usually, a high-surface-area monolith is dried, evacuated, and dipped in a solution containing a precursor of the active phase. After drying and calcination a monolithic catalyst is obtained. Often, an activation step is necessary to convert the precursor of the active phase into the active phase, e.g., the transformation of a metal oxide in the corresponding metal or metal sulfide. Monolithic catalysts with complex compositions of active phases can be prepared by sequential impregnations with suitable solutions or with a conunon solution containing various precursors of the components. 

Arsenic and iron concentrations in the sediment porewaters were found to be closely correlated. Although these concentrations are considerably elevated at depth in the sediment column—reaching 17 pM (1.3 mg/L) for arsenic and 1.6 mM (90 mg/L) for iron—only a small fraction of the iron and arsenic deposited to the sediments needs to be remobilized to support these concentrations. XAS analysis of the sediments indicated that arsenic in the solid phase is reduced from As(V) to As(III) above the depth at which arsenic is released into the porewater. Iron in solid phase remains as Fe(III). XAS analysis showed no evidence of conversion to magnetite (though conversion of ferrihydrite to goethite could not be excluded). Sequential extractions indicated that most of the arsenic can be released from sediment by treatment with magnesium chloride or phosphate solutions this treatment does not release iron, behavior that is consistent with sorption as a mode of association for the majority of the arsenic with the sediment. The remainder of the arsenic is released, along with almost all the iron, by treatment with hydrochloric acid.15... 

The use of electrochemical atomic layer epitaxy for the electrosynthesis of high quality thin films of thermoelectric materials is studied. Specifically, the use of sequential underpotential deposition (upd) cycles of Sb and Co for the production of CoSb phases on Au substrates is investigated. Stable atomic layers of Sb can be formed on Au, and were imaged for the first time by STM. These layers consist of randomly distributed islands of Sb with a mean diameter of 5.5 nm and a mean height of 0.35 nm. Co upd layers appear to form in situ on Au, but do not survive transfer to the Sb deposition solution. In contrast, stable upd layers of Co can be produced on the Sb/Au surface. In addition, there is a 180 mV positive shift of the Co upd formal potential to more positive values, suggestive of the formation of a stable CoSb phase. 

---