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Standard deflectors

The tube proportions in the basket evaporator are about the same as in the standard vertieal. One important feature of the basket-type evaporator is the ease with which a deflector may be added in order to reduce entrainment from spouting. The boiling in the vertical-tube evaporator is quite violent, and this tends to cause entrainment losses. This condition is accentuated if the liquor level in the evaporator is low. A baffle such as shown in Figure 9 largely prevents these losses and is much more easily added to the basket type than to the standard type. Other differences between the standard and the basket type are largely details of construction. [Pg.102]

If a flame arrester is provided with cowls, weather hoods, deflectors, etc., it must be tested for the configuration involved if the test is done to meet the UL, USCG, or CEN standard (see Chapter 8). Maintenance of a flame arrester should be performed carefully to avoid any adverse impact on arrester performance (see Chapter 7). All flame arresters should be inspected regularly as operating experience dictates (see Chapter 7). [Pg.181]

The 2 pi of the concentrated peptide solution was mixed with 4 pi of 2,5-dihydroxybenzoic acid [ 7 mg in 500 pi of the mixture of acetonitrile/0.1% trifluoroacetic acid, 1/2 (v/v)]. The resulting mixture was applied to the MALDI steel plate and left to crystallise. Afterwards, the MALDI-TOF mass spectra were measured by a BIFLEX IV instrument (Bruker, Germany) under appropriate conditions (potential 19 kV on the plate and 15.05 kV on the deflector, positive reflector mode potential 20 kV, laser intensity 50 or 60%). The range of detected masses was from 600 to 3000 Da. For the external calibration the standard mixture of peptides M-Pep was used. [Pg.175]

An electron beam is of much shorter wavelength than the radiation used in standard microlithography and, therefore, provides greater resolution possibilities. For resist exposure a beam of electrons can be used whose position is controlled by a computer-driven beam deflector, thus obviating the need for a mask. Both positive- and negative-working resists are used for electron beam lithography. [Pg.609]

The standard deviation reported in Figure 3 indicates that the maximum temperature varies from specimen to specimen per sample. After subsequent analysis, it was realized that the flame test procedure should be modified to include a heat shield around the specimen in order to prevent additional hot air flow from affecting the temperature reading on the back side of the steel plate. With the additional heat deflector, it is assumed that the standard deviation of the maximum temperature would decrease per sample. [Pg.2353]


See other pages where Standard deflectors is mentioned: [Pg.392]    [Pg.393]    [Pg.392]    [Pg.393]    [Pg.101]    [Pg.101]    [Pg.68]    [Pg.101]    [Pg.104]    [Pg.80]    [Pg.500]    [Pg.192]    [Pg.303]    [Pg.65]    [Pg.393]    [Pg.394]    [Pg.78]   
See also in sourсe #XX -- [ Pg.367 ]




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Deflector

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