Stamp patterning

The chromophore J-aggregation at the Ti02/electrolyte interface is controlled by the pH at the deposition stage. The performance of the devices is enhanced by stamp patterning rather than lithographic patterning. This approach opens the door to many potential applications such as the fabrication of flexible, thin film photovoltaic systems. 

Flastomeric stamp patterning of ITO using tetrabutyl-ammonium hydroxide (TBOH) was demonstrated [329]. The stamp is immersed for 2 min in a 3 x 10 M solution of TBOH in ethanol or water. After drying under N2 flow, the stamp was pressed onto cleaned ITO and removed after a few seconds. TBOH reacts with the surface of ITO to form a double ionic layer that drastically inhibits the abihty to inject holes in the device [329]. 

The patterned SAM samples were prepared by the procedures illustrated in Fig. 1 [56]. As the first step, two types of p-GP methods [53, 57] were used to make stamped patterns on the goldethanol solution for 30 seconds and then removing the excess solution under a stream of nitrogen. The... 

FIGURE 28.6 Representative oil thickness via taping data for three postage stamp patterns. 

Sublimation (diffusion) printing is a textile process in which color patterns in dry die crystals are transferred from a release film to the fabric under high heat and pressure. The process has been adapted to plastics. The equipment used is very similar to that used for hot stamping. Under heat and pressure, the dye crystals sublime (go directly to the vapor phase from the solid phase without melting) and the vapor penetrates the plastic product. As a result, the decoration is very durable and wear resistant. It is also cost competitive against other processes such as two-step injection molding or silk screening. 

Stamping microcontact printing 50nm-1.5pm Direct development of patterned film Lateral resolution Waveguides, capacitors, diffraction gratings, lab-on-a-chip structures... 

Loo, Y. L. Willett, R. L. Baldwin, K. W. Rogers, J. A. 2002. Additive, nanoscale patterning of metal films with a stamp and a surface chemistry mediated transfer process Applications in plastic electronics. Appl. Phys. Lett. 81 562-564. 

Park, J. D. Lee, K. D. 2007. Method for manufacturing stamp for nanoimprint lithography having two-dimensional pattern of uniform size and shape, and method for photonic crystal using the same. LG Electronics Inc., S. Korea. 

Kim, Y.-K. Kim, G T. Ha, J. S. 2007. Simple patterning via adhesion between a buffered-oxide etchant-treated PDMS stamp and a Si02 substrate Adv. Fund. Mater. 17 2125-2132. 

Fig. 8.5 A scanning electron micrograph of a silicon dioxide mold with reverse patterns the left and right trenches create a bus and a microring waveguides, respectively. The high aspect ratio protruded wall between trenches is used to stamp out a narrow coupling gap. Reprinted from Ref. 42 with permission. 2008 American Vacuum Society...

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