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Semiconductors integrated circuits

Although there has been theoretical and experimental interest in the effects of ion bombardment on materials since about 1960 (153), the growth in ion implantation technology and appHcations since then is due almost solely to the semiconductor (integrated circuit) industry. The advantages of ion implantation for semiconductor doping were first pointed out in 1955 (154), but these advantages were not widely accepted until about 1970. [Pg.399]

W. R. Runyan and K. E. Bean, Semiconductor Integrated Circuit Processing Technology, Addison-Wesley, Reading, Mass., 1990. See discussion and references. [Pg.533]

Fig. lab. Some types of electronic connectors, (a) Receptacle for dual-in-line package (DIP) semiconductor integrated circuit, (b) Connectors for printed circuit boards having edge contacts two-piece connectors have male and female connector halves, one of which is attached to the printed circuit board. [Pg.23]

Fig. 6. Schematic of a cross section of a typical multilevel CMOS (complimentary metal oxide semiconductor) integrated circuit structure. Fig. 6. Schematic of a cross section of a typical multilevel CMOS (complimentary metal oxide semiconductor) integrated circuit structure.
The discovery of semiconductor integrated circuits by Bardeen, Brattain, Shockley, Kilby, and Noyce was a revolution in the micro and nano worlds. The concept of miniaturization and integration has been exploited in many areas with remarkable achievements in computers and information technology. The utility of microchips was also realized by analytical scientists and has been used in chromatography and capillary electrophoresis. In 1990, Manz et al. [1] used microfluidic devices in separation science. Later on, other scientists also worked with these units for separation and identification of various compounds. A proliferation of papers has been reported since 1990 and today a good number of publications are available in the literature on NLC and NCE. We have searched the literature through analytical and chemical abstracts, Medline, Science Finder, and peer reviewed journals and found a few thousand papers on chips but we selected only those papers related to NLC and NCE techniques. Attempts have been made to record the development of microfluidic devices in separation science. The number of papers published in the last decade (1998-2007) is shown in Fig. 10.1, which clearly indicates rapid development in microfluidic devices as analytical tools. About 30 papers were published in 1998 that number has risen to 400 in... [Pg.263]

An important new application for MOCVD is the deposition of pure metal films for semiconductor integrated circuit applications. Important metals deposited by MOCVD include Al, Cu, CuAl alloys, and W films using precursors listed in Table I. It is expected that this application area for MOCVD will expand rapidly in the next few years as the demand increases for high-density metal interconnects for Si integrated circuit technology. High-purity Al metal films have also been grown by MOCVD. [Pg.424]

Saeki, H. Kohda, M. Proc. 17th Symp. Semiconductor Integrated Circuit Technol. Tokyo, 1979, p. 48. [Pg.117]

Figure 6.15 Typical high-volume production mold and work-loading fixtm s for encapsulating semiconductor integrated circuits hy transfer molding. Figure 6.15 Typical high-volume production mold and work-loading fixtm s for encapsulating semiconductor integrated circuits hy transfer molding.
In the manufacture of semiconductor integrated circuits, it is of the utmost importance to manufacture in a contaminant-free environment. The wafers and chips containing integrated circuits will fail if a particulate or ion contaminant shorts out any one of the circuit connections. As more and more integrated circuits are placed on the silica wafer the distance between the circuit connections become less. This means contamination is becoming more of an issue so that it has been proposed to monitor the air for airborne ionic contaminants. [Pg.325]

Ceramic materials play an important role in the electronics industry. Semiconductor integrated circuits are typically mounted on a ceramic substrate, usually alumina. Some ceramics, notably quartz (crystalline Si02), are piezoelectric, which means that they generate an electrical potential when subjected to mechanical stress. This property enables us to use piezoelectric materials to control frequencies in electronic circuits, as in quartz watches and ultrasonic generators. [Pg.470]

Semiconductor, Integrated Circuit, and Hybrid Device Screening Tests... [Pg.700]

These amorphous fluoropolymers are chemically as well as thermally stable, soluble in fluorinated solvents, have low dielectric constants, and the films are transparent. They have unique properties compared to traditional fluoropolymers. The amorphous polymers have high potential in many applications. The following are representative examples that are being pursued polymer waveguides [24,25], pellicles used in the photolithographic reproduction of semiconductor integrated circuits [26], insulators and hydrophobic surfaces for electrowetting [27,28], polymer optical fibers [29,30], and membranes for gas separations [31-33], Here, we describe two examples of the use of the amorphous perfiuorinated polymers optical fibers and gas separation membranes. [Pg.387]

Electronics manufacturers use hydrogen at several steps in the complex processes for manufacturing semiconductors (integrated circuits). Hydrogen is used ... [Pg.420]

Originally, operational amplifiers (op-amps) were used in computers to perform mathematical operations. With the development of semiconductor integrated circuits, small and inexpensive op-amps have become available and are now being used in place of conventional discrete component amplifiers in many applications. Basically an op-amp is a very high-gain (theoretically infinite-gain) amplifier. In use, it is normally connected in a feedback mode of operation. That is, a portion of the output voltage is... [Pg.164]

There are many different types of facility configurations in the industry. Table 1 highlights t3 ical chemicals present at a semiconductor/ integrated circuit manufacturing facility. It is not intended to be a complete or exhaustive listing. [Pg.61]


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