Lithography scanning probe microscope

It was found that 5-nm-thick resist-mask polysilane films worked well in a direct lithography process on silicon substrates, resulting into a line width of 40 nm prepared by scanning probe microscope lithography, using a carbon nanotube tip.57 Thin PMPS films of 6—8 nm, with a molecular weight of 30,000 were prepared by spin casting and cured at 150°C to obtain a smooth surface. It has been interpreted that moisture was essential for the oxidation of the polysilane. The proposed mechanism involved dissociation of Si-Si bonds in polysilane by the electron injection from the carbon nanotube tip catalyzed by moisture. 

In this chapter we provide a brief review of different nanolithography and nanomanipulation techniques. We discuss mainly such techniques as templated growth, dip pen lithography, anodic oxidation and scanning probe microscope based nanomanipulation. The chapter contains an introduction to the basic techniques followed by examples of such nanostructure growth. 

Dip-pen nanohthography (DPN) is a direct-write scanning probe-based lithography method in which an atomic force microscope (AFM) tip or array of tips is used to deliver chemical reagents directly to specific regions of a substrate surface. 

The readers interested in near-field optical microscopic manipulation and a local optical observation should be referred to a review article [296]. Such a SPM technique for lithography, which is referred to as scanning probe lithography (SPL), can be applied to a wide variety of functional... 

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