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RIE

Linnhoff, B., and de Leur, J., Appropriate Placement of Furnaces in the Integrated Process, IChemE Symp. ries No 109, 1988. [Pg.211]

Fig. IV-18. (a) Electron micrograph of a collapsing film of 2-hydroxytetracosanoic acid. Scale bar 1. [From H. E. Ries, Jr., Nature, 281, 287 (1979).] (b) Possible collapse mechanism. [Reprinted with permission from H. E. Ries, Jr. and H. Swift, Langmuir, 3, 853 (1987) (Ref. 223). Copyright 1987, American Chemical Society.]... Fig. IV-18. (a) Electron micrograph of a collapsing film of 2-hydroxytetracosanoic acid. Scale bar 1. [From H. E. Ries, Jr., Nature, 281, 287 (1979).] (b) Possible collapse mechanism. [Reprinted with permission from H. E. Ries, Jr. and H. Swift, Langmuir, 3, 853 (1987) (Ref. 223). Copyright 1987, American Chemical Society.]...
Fig. XV-6. Pressure-area isotherms for a synthetic lecithin at the indicated temperatures in degrees Celsius. [From H. E. Ries, Jr., M. Matsumoto, N. Uyeda, and E. Suito, Adv. Chem. Ser, No. 144, ACS, 1975, p. 286 (Ref. 37). Copyright 1975, American Chemical Society.]... Fig. XV-6. Pressure-area isotherms for a synthetic lecithin at the indicated temperatures in degrees Celsius. [From H. E. Ries, Jr., M. Matsumoto, N. Uyeda, and E. Suito, Adv. Chem. Ser, No. 144, ACS, 1975, p. 286 (Ref. 37). Copyright 1975, American Chemical Society.]...
Figure C2.18.2. Schematic representations of various experimentai configurations for piasma etching, (a) Reactive ion etching (RIE). (b) Eiectron cyciotron resonance etching (ECR). (c) Chemicaiiy assisted ion beam etching (CAIBE). The configurations are described in tire text. Figure C2.18.2. Schematic representations of various experimentai configurations for piasma etching, (a) Reactive ion etching (RIE). (b) Eiectron cyciotron resonance etching (ECR). (c) Chemicaiiy assisted ion beam etching (CAIBE). The configurations are described in tire text.
Variously trisubstituted thiazoles were prepared by Ried and Kaiser by condensing PhNHCPh=NCSR with BrCH R, (Scheme 149), R = OEt, morpholino and Ri = 4-NO2C6H4, Ac, Bz, COjEt, CN, 4-PhCsH4CO, NO2, 4-NO2C6H4CO, 4-BrCgH4CO, COCHaBr yields ranged from 45 to 92% (811). [Pg.307]

Thus electrostatic potential maps can give an exag gerated picture of the charge distribution when the entire palette is used In most cases that won t mat ter to us inasmuch as we are mostly concerned with the distribution within a single molecule In those few cases where we want to compare trends in a se ries of molecules we II use a common scale and will point that out... [Pg.16]

We begin with the experimentally determined three dimensional structure of a mol ecule then propose bonding models that are consistent with the structure We do not claim that the observed structure is a result of the bonding model Indeed there may be two or more equally satisfactory models Structures are facts bonding models are theo ries that we use to try to understand the facts... [Pg.64]

When however the ionic addition of hydrogen bromide to 1 3 butadiene is car ried out at room temperature the ratio of isomeric allylic bromides observed is differ ent from that which is formed at — 80°C At room temperature the 1 4 addition product predominates... [Pg.406]

Professor Ronald Breslow of Columbia University has car ried out a number of organic reactions in the presence of cyclodextrms to study the effect of a molecule s envi ronment on its chemical reactivity... [Pg.1049]

Much of the fundamental work on prostaglandins and related compounds was car ried out by Sune Bergstrom and Bengt Samuelsson of the Karohnska Institute (Sweden) and by Sir John Vane of the Wellcome Foundation (Great Britain) These three shared the Nobel Prize for physiology or medicine m 1982... [Pg.1084]

Although the two approaches differ m respect to the phase m which the synthesis is car ried out the overall strategy is the same m both... [Pg.1136]

Reactive extrusion Reactive groups Reactive ion etching (RIE)... [Pg.842]

Fig. 37. Resist images obtained with a cross-linking monocomponent TSI resist (PHOST polymer), cross-linked by photo-oxidation using light at 193-nm wavelength. After exposure, the film was treated with a vapor of dimethyl silyl dimethyl amine and then plasma developed using O2—RIE (122). Fig. 37. Resist images obtained with a cross-linking monocomponent TSI resist (PHOST polymer), cross-linked by photo-oxidation using light at 193-nm wavelength. After exposure, the film was treated with a vapor of dimethyl silyl dimethyl amine and then plasma developed using O2—RIE (122).

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See also in sourсe #XX -- [ Pg.1061 ]




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Deep RIE

Oxygen RIE pattern transfer

RIE Etch Back

RIE-etched silicon

RIE—See Reactive ion etching

Rearrangements in the excited states RIES)

Ried, W„ Heinz, B„ Four-Membered Rings

Ried, W„ Heinz, B„ Four-Membered Rings Containing One Sulfur Atom

Ries crater

Ries, Nancy

Silicon RIE

Three-layer RIE PCM

Two-layer spun-on RIE PCM

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