RF power supply

The etch experiments were performed using a commercial ICP etcher equipped with an ICP source and a load lock. The substrate susceptor was cooled by He through a chilled fluid. The coil, which was connected to a 13.56 MHz RF power supply, was located on the lid of a ceramic chamber to generate a high density plasma. A bias voltage induced by RF power at... 

For FT-ICR-MS, the ICR cell itself must not necessarily differ from one used in scanning ICR-MS (Fig. 4.51). Two of the four side walls (jc-axis) of the ICR cell are connected to the RF power supply during the period of excitation. Then, the image current induced in the detector plates (y-axis) is recorded as transient signal for some period of time (0.5-30 s). The excitation of the ions within the ICR cell has to stop at a level low enough to avoid wall collisions of the lightest ions to be measured. [191,200,201]... 

Prior to application of the aqueous solution of 3-APTHS, the samples were subjected to a water plasma treatment for 1-3 h. The pressure of water vapor in the plasma chamber was 26 Pa. The plasma was fired by an RF power supply. 

ICP forward power Frequency of rf power supply Number of simultaneous channels Observation height Plasma Ar flow rate Auxiliary Ar flow rate Carrier Ar flow rate Supplementary buffer flow rate Emission lines... 

The platen is grounded, and the upper electrode is powered with a low-frequency rf power supply ( 50 kHz) at a power level of 500 to 1000 watts. The reactor operates in the batch mode with a wafer load of twenty-two 4-inch wafers, for example. For larger wafers, the load size is less. Although the load size is restricted, high quality films are produced.7... 

The hot wall approach to the plasma-enhanced CVD system has been described in Chapter 3. A schematic of a typical system is shown in Figure 21. The elements of this system are similar to that of the cold-wall system just described. There is a gas panel, vacuum system, and an RF power supply to create the discharge. The RF frequency typically used is 400 kHz. The reaction chamber of such a system is shown in Figure 22. The electrodes are a set of several long narrow rectangular slabs of graphite with pockets cut into them. The graphite electrodes lead to some problems with particulate contamination, but attempts to use aluminum have not been successful. 

The resolution of a quadrupole is not only determined by the ratio of DC and RF, but also by the quality and the alignment of the rods. The potential of enhanced resolution in a quadrapole mass filter was investigated by Tyler et al. [33], Enhanced resolution leads to a significant loss in response. Recently, Thermo Fiimigan introduced a triple-quadrapole instrument with improved quadrapole design, RF power supply stability, and temperature control (TSQ Quantum), enabling 0.1-unit-mass resolution without dramatic losses in response [34]. 

The ICP source subsystem incorporates its own internal microcomputer and memory in order to execute the controller s commands. The RF power supply Is under computer control. Likewise, all of the argon flows, the ignitor, peristaltic pump and safety interlocks are directly controlled by the system computer. The RF power output Is stable to less than 0.01 over 1 h of operation. The nebulizer argon flow is controlled through a thermostated mass flow controller to ensure long-term stability. The uptake rate of the two-channel peristaltic pump Incorporated within the source subsystem Is variable by the system controller. 

FIGURE 7.4 Photographs taken from the same position in the ESR Experimental Hall and showing the construction of the HITRAP platform. Left situation in 2004 before construction. Middle situation in 2005 when the platform was erected for the huts housing the electronics of the HITRAP facility and of the HITRAP experiments, for RF power supplies and other devices. Right panel situation in 2006 when the platform is ready, the huts are in place, and the installations are almost completed. 

M — monomer, Ar — argon, S — substrate, Sh — shutter, EB — metal evaporator, rf — to rf power supply, P—to pumps, C—cooling, H — heating, T — metal target... 

Internal electrode reactor with RF power supply... 

FIGURE 18 The basic operation of an acousto-optic device is to reduce the intensity of a transmitted beam by diffraction from a refractive index grating that is generated, via the photo-elastic effect, by the RF power supplied to the transducer. The device depicted is used for Q-switching and cavity dumping. If configured as a resonator for the acoustic wave, it serves as a mode-locker. 

The intensity distribution of the synchrotron radiation is schematically shown in O Fig. 50.19. The energy of the radiation increases rapidly with the energy of the particles. One can see that the synchrotron is a good transformer of the RF power supplied to the acceleration system into shortwave radiation (visible light and X-rays). A review of synchrotron light sources is given by Eriksson (1994). 

To reduce the volume of the plasma source for more efficient breakdown of the precursor gas due to the higher power density delivered from the RF power supply. 

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