Wavelength resolution

A positive resist silicon-containing polymer, (V), was prepared by Kinsho [4] having a resolution wavelength of less than 300 nm that was resistant to oxygen plasma etching. 

The overall dependency of CTF on resolution, wavelength, defocus, and spherical aberration is given by... 

It has been predicted theoretically by Sinha et al. [S5] and observed experimentally by Jensen and Robinson [J4, R2] that if UFs is cooled to 55 K and its absorption spectra measured with high resolution, wavelengths can be found at which selective absorption by UFs takes place with relatively little absorption by The reason for this is as follows. 

We need to point out that, if the wavelengths of laser radiation are less than the size of typical structures on the optical element, the Fresnel model gives a satisfactory approximation for the diffraction of the wave on a flat optical element If we have to work with super-high resolution e-beam generators when the size of a typical structure on the element is less than the wavelengths, in principle, we need to use the Maxwell equations. Now, the calculation of direct problems of diffraction, using the Maxwell equations, are used only in cases when the element has special symmetry (for example circular symmetry). As a rule, the purpose of this calculation in this case is to define the boundary of the Fresnel model approximation. In common cases, the calculation of the diffraction using the Maxwell equation is an extremely complicated problem, even if we use a super computer. 

To restore resolution, we proposed a signal processing method based on Papoulis deconvolution. We implemented this algorithm and tried to operate an improvement from an aluminum rod smaller than the wavelength. 

The design and use of spectrographs or spectrometers involves a compromise between resolution—how close in wavelength two lines can be and still be seen as separate—and sensitivity—how weak a light can be observed or how... 

The spectral resolution of the Fourier transfonned data is given by the wavelength corresponding to the maximum optical delay. We have and therefore AD = 1/5,. Therefore, if 0.1 cm spectral... 

This assumes that both spectra have the same resolution, and that it takes the same amount of time to collect the whole interferogram as is required to obtain one wavelength on the dispersive instrument (which is usually a reasonable assumption). Thus, interferograms can be obtained and averaged together in the same... 

Nonnal spontaneous Raman scahering suffers from lack of frequency precision and thus good spectral subtractions are not possible. Another limitation to this technique is that high resolution experiments are often difficult to perfomi [39]. These shortcomings have been circumvented by the development of Fourier transfomi (FT) Raman spectroscopy [40]. FT Raman spectroscopy employs a long wavelength laser to achieve viable interferometry. 

Light microscopy is of great importance for basic research, analysis in materials science and for the practical control of fabrication steps. Wlien used conventionally it serves to reveal structures of objects which are otherwise mvisible to the eye or magnifying glass, such as micrometre-sized structures of microelectronic devices on silicon wafers. The lateral resolution of the teclmique is detennined by the wavelength of tire light... 

While the spatial resolution in classical microscopy is limited to approximately X/2, where X is the optical wavelength (tlie so-called Abbe Limit [194], -0.2 pm with visible light), SNOM breaks through this barrier by monitoring the evanescent waves (of high spatial frequency) which arise following interaction with an... 

The preparation of the reflecting silver layers for MBI deserves special attention, since it affects the optical properties of the mirrors. Another important issue is the optical phase change [ ] at the mica/silver interface, which is responsible for a wavelength-dependent shift of all FECOs. The phase change is a fimction of silver layer thickness, T, especially for T < 40 mn [54]. The roughness of the silver layers can also have an effect on the resolution of the distance measurement [59, 60]. 

The solvent chosen must dissolve the sample, yet be relatively transparent in the spectral region of interest. In order to avoid poor resolution and difficulties in spectrum interpretation, a solvent should not be employed for measurements that are near the wavelength of or are shorter than the wavelength of its ultraviolet cutoff, that is, the wavelength at which absorbance for the solvent alone approaches one absorbance unit. Ultraviolet cutoffs for solvents commonly used are given in Table 7.10. 

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