Resist materials self-assembly structure formation

Popular approaches to molecular self-assembly, which can give structures in the nanometer to millimeter range, are based on SAMs and LBL deposition of electrolytes. Self-assembly leads to equilibrium structures that are close to the thermodynamic minimum and result from multiple weak, reversible interactious betweeu subuuits which include hydrogen bonds, ionic bonds, and van der Waals forces. As information is already coded in the building blocks, this is a means to avoid defect formation in aggregate formation. SAMs are molecular assemblies of long chain alkanes that chemisorb on the patterned and unpat-temed surfaces of appropriate solid materials. The structures of SAMs, effectively 2D-crystals with controllable chemical functionality, make them a means to modify substrates to direct protein adsorption and cell attachment, surface passivation, ultrathin resists and masks and sensor development. 

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