Resin acids, rearrangement

The rearrangement of some resin acids 226,227, and 228 in superacidic HSO3F and HSO3CI media has also been studied.836,837 Jacquesy and et al.838,839 have developed a novel isomerization of pregnan-3,20-diones 229 to mixture of isomers that also contains 13a isomers. The reaction is proposed to occur through the cleavage of C(13)-C(17) bond (Scheme 5.83). 

Resin acids have been used to catalyze the hydrolysis of /3-hydroxyamides (1) (the reduction products of peptides). The hydrolysis proceeds via N O acyl transfer, but an additional advantage is observed when the resin acid is used. Once the free amino group is formed, it gets bound (ionically) to the resin (Scheme 13-2). On hydrolysis of the rearranged jS-amino ester (2), the amine component (3) remains on the resin while the acid component (4) goes into solution. Thus, the separation of the products is simplified (Bora et ai, 1976). 

A new methodology for transforming resinic acids into nor-alcohols and nor-alkenes via the Baeyer-Villiger rearrangement of the derived aldehyde has been described see Scheme 103. The methodology has been used to synthesize two new terpenoids from abietic acid." ... 

Herz, W., and A. L. Hall Resin Acids XXVI. Biogenetic-Type Rearrangements of the Homoallylic Cation from Methyl 15(R)-Hydroxypimar-8(14)-en-18-oate. J. Organ. Chem. (USA) 39, 14(1974). 

Positive photoresists, by contrast, are based on water-soluble novolak resins with naphthalene diazoquinone sulfonate (NDS) as the photosensi-tiser. On photolysis the NDS causes a rearrangement in the polymer to yield nitrogen gas plus an indene carboxylic acid. This latter functional group considerably increases the solubility of the polymer, hence solubilising those areas of the polymer that had been exposed to light. 

The availability of Nafion on silica has not only lowered the cost of the resin but also has made it versatile (Sun et al., 1997 Harmer et al., 1998). A number of industrially important reactions have been attempted, with considerable success, with these catalysts. Consider the Fries rearrangement of phenyl acetate to p-acetyl phenol (/t-hydroxy acetophenone). This has been accomplished by Hoelderich and co-workers (Heidekum, 1998). In the ca.se of alkylation of benzene with benzyl alcohol, Amberlyst-15 and p-toluene sulphonic acid are ineffective and Nafion on silica works well at 80 °C. 

Poly(vinyl alcohol) has the structure 10.67. Poly(vinyl acetate) is the fully esterified derivative of polyfvinyl alcohol), in which the -OH groups are replaced by -OCOCH3 groups. As indicated in Table 10.5, commercial polyvinyl sizes are effectively copolymers of polyfvinyl acetate) and polyfvinyl alcohol) that vary in the degree of saponification of the ester groups. These products may comprise 100% of either polymer, or combinations of the two monomers in any proportions. Crotonic acid (2-butenoic acid), widely used in the preparation of resins, may also be a component. This compound exhibits cis-trans isomerism (Scheme 10.17). The solid trans form is produced readily by catalysed rearrangement of the liquid cis isomer. 

The workhorse of the VLSI industry today is a composite novolac-diazonaphthoquinone photoresist that evolved from similar materials developed for the manufacture of photoplates used in the printing industry in the early 1900 s (23). The novolac matrix resin is a condensation polymer of a substituted phenol and formaldehyde that is rendered insoluble in aqueous base through addition of 10-20 wt% of a diazonaphthoquinone photoactive dissolution inhibitor (PAC). Upon irradiation, the PAC undergoes a Wolff rearrangement followed by hydrolysis to afford a base-soluble indene carboxylic acid. This reaction renders the exposed regions of the composite films soluble in aqueous base, and allows image formation. A schematic representation of the chemistry of this solution inhibition resist is shown in Figure 6. 

Figure 18. Diazonaphthoquinone-novolac resist. The novolac (Novolak) matrix resin is prepared by acid catalyzed copolymerization of cresol and formaldehyde. The base insoluble sensitizer, a diazohaphthoquinone, undergoes photolysis to produce a carbene which then undergoes Wolff rearrangement to form a ketene. The ketene adds water which is present in, the film, to form a base soluble, indenecarboxylic acid photoproduct.

Bisphenol A [(bis-4-hydroxyphenol)dimethylmethane], used for the production of epoxy resins and polycarbonates, is obtained by the acidic condensation of phenol and acetone. Here, the carbonium ion produced by the protonation of acetone attacks the phenol molecule at the para position producing a quinoidal oxonium ion that loses water and rearranges to a p-isopropylphenol carbonium ion. The water attacks another phenol molecule, also in the para position, giving another quinoidal structure that rearranges to bisphenol A. It has been found that bisphenol A may be involved in one of the endocrine systems. The consequences of this are still being determined. 

At the present time, most of the positive photoresists used in the manufacture of microcircuits consist of a low molecular weight phenolic resin and a photoactive dissolution inhibitor. This composite system is not readily soluble in aqueous base but becomes so upon irradiation with ultraviolet light. When this resist is exposed, the dissolution inhibitor, a diazoketone, undergoes a Wolff rearrangement followed by reaction with ambient water to produce a substituted indene carboxylic acid. This photoinduced transformation of the photoactive compound from a hydrophobic molecule to a hydrophillic carboxylic acid allows the resin to be rapidly dissolved by the developer. (L2,3)... 

Head-to-tail rearrangement of four isoprene units results in the formation of diterpenes (C20H32), as seen also in Fig. 4.2. Diterpenes are generally found in resins, e.g. pimaric acid and abietic acid. Some diterpenoids are also constituents of essential oils, e.g. phytol [3, 7-14, 37, 52, 53]. Like sesquiterpenes, diterpenes are heavier than monoterpenes therefore, they require more energy to go to the vapour phase. For this reason, longer distillation times are necessary for their recovery. The DNP lists 118 different structural types for diterpenoids [37]. Important diterpenes found in essential oils will be detailed. Some representatives of volatile diterpenes are as in Structure 4.32. 

The rearrangement of the 5-cyano-4,5-dihydro-l//-azepine (93) to furo[2,3-6]pyridine (95 Scheme 9) with sodium nitrate in glacial acetic acid or with silver nitrate in aqueous ethanol proceeds by initial protonation at either C-3 or C-6 followed by hydrolysis to the cyanooctanedione ester (94). By carrying out the rearrangement with an acid ion exchange resin it is now possible to isolate the dione ester (77CJC4061). Likewise, the hydrolysis of the tetrahydro-2-benzazepine (96) to an 0 -(anilinoalkyl)benzophenone is an example of proton attack at the /3 -carbon of the enamine system (77JA5045). 

To avoid the formation of ketenes by alkoxide elimination, ester enolates are often prepared at low temperatures. If unreactive alkyl halides are used, the addition of BU4NI to the reaction mixture can be beneficial [134]. Examples of the radical-mediated a-alkylation of support-bound a-haloesters are given in Table 5.4. Further methods for C-alkylating esters on insoluble supports include the Ireland-Claisen rearrangement of O-allyl ketene acetals (Entry 6, Table 13.16). Malonic esters and similar strongly C,H-acidic compounds have been C-alkylated with Merrifield resin [237,238]. 

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