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Impurities residual

It is for this reason, and because they are generally non-specific and possess an acceptable polarity, that methylene chloride and ethylene chloride are by far the most frequently employed solvents in cationic polymerisation. [Pg.19]

The fourth major parameter which defines a system after the monomer, the initiator(s) and the solvent, is the temperature at which the polymerisation is conducted. The effect of temperature upon the position of the propagation-depropa tion equilibrium (ceiling temperature) is not directly relevant and too well-known to be discus here. We are obviously more interested in discussing the specific role of temperature in the reactions leading to the formation of chain carriers. The following considerations are pertinent to the kinetics of such interactions and to the thermodynamics of the reailting equflibria. [Pg.19]

The best laboratories engaged in cationic polymerisation have earned their reputation partly because of the painstaking care with which they design and set up their experiments. The reasons for demanding procedures stem from the very pronounced reactivity of both catalysts and carbenium ions. Any nucleophilic impurity can alter substantially [Pg.19]

If the removal of specific impurities is fundamental to obtaining reliable results, equally important is the minimisation of the residual water concentration in a cationic system. This experimental aspect deserves some ccanments. Allhcxigh the attainment of dry conditions diould be a sine qua non to anyone working in cationic polymerisation, the actual moisture level acceptable in a given study can vary appreciably with such factors as the type of initiation, the nature and concentration of the catalyst, etc. Thus,bare-cation polymerisations initiated by 7-rays or field ionisation as well as studies on direct initiation by Lewis acids require the maximum degree of dryness attainable by present techniques ( M of residual water). On the other hand, certain systems [Pg.20]


Quality Control. The spectrometer is the most suitable instmment for determining most low level residual impurities. ASTM E414 is the standard method for the measurement of impurities in copper by the briquette dc-arc technique (65). In this method, the sample in the form of chips, drillings, or powder is briquetted and excited in a d-c arc opposite a high purity copper rod. Impurities in the ranges noted can be measured ... [Pg.211]

With VPD preconcentration, the angular dependence of the impurity fluorescence yield foUows the curve for residue impurities, as shown in Figure 1, in contrast to the plated-impurity case using direct TXRF. [Pg.353]

Of course, a primary concern for any physical property measurement, including gas solubility, is the purity of the sample. Since impurities in ILs have been shown to affect pure component properties such as viscosity [10], one would anticipate that impurities might affect gas solubilities as well, at least to some extent. Since ILs are hygroscopic, a common impurity is water. There might also be residual impurities, such as chloride, present from the synthesis procedure. Surprisingly though, we found that even as much as 1400 ppm residual chloride in l-n-octyl-3-methylimi-dazolium hexafluorophosphate and tetrafluoroborate ([OMIM][PFg] and [OMIM] [BF4]) did not appear to have any detectable effect on water vapor solubility [1]. [Pg.84]

The elements of primary importance in this context are oxygen, nitrogen, carbon and hydrogen. In the technology of the liquid alkali metals they play a predominant rdle. Their origin is associated with leakages in the circuit, impurities remaining after construction or residual impurities in the liquid metal. It is convenient to discuss these four elements separately. [Pg.431]

On the other hand, potential measurements at the free surface of purified water have shown50 that the value for a flowing surface differs by about 0.3 V from that for a quiescent surface, as a result of adsorption of surface-active residual impurities in the solution (probably also coming from the gas phase). Since emersed electrodes drag off the surface layer of the solution as they come out of the liquid phase, the liquid layer attached to emersed solid surfaces might also be contaminated. [Pg.14]

The catalysts had to be free of residual impurities such as chloride ions, nitrates, solvent, or other precursor species. [Pg.348]

Oxygen and carbon have substantial solid solubilities in niobium at the temperatures normally required for reduction. As the activity coefficients of both carbon and oxygen in niobium are low, their retention in the niobium metal produced by the carbothermic reduction of niobium oxide is expected. It is, however, possible (as explained later) to remove these residual impurities by extending the pyrovacuum treatment to still higher temperatures and lower pressures. [Pg.372]

The free evaporation equation given above refers to impurity removal from a solid or a liquid solution. When the residual impurity has not formed a solution, its activity remains unity and the Langmuir equation becomes... [Pg.442]

Selectivity increases complexity and/or residual impurities Staged operation and cooling for high purity Commercial high acid-gas pressure bulk removal favored 1,2,3, 4, 5... [Pg.19]

Soluble polymer-bound catalysts for epoxidation reactions have also been explored, with a complete study into the nature of the polymeric backbone performed by Janda [70]. Chiral (salen)-Mn complexes were appended to MeO-PEG, NCPS, Jan-daJeF and Merrifield resin via a glutarate spacer. It was found that for the Jacobsen epoxidation of ds-/ -mefhylstyrene, the enantioselectivities for each polymer-supported catalyst were comparable (86-90%) to commercially available Jacobsen catalyst (88%). Both soluble polymer-supported catalysts could be used twice before a decline in yield and enantioselectivity was observed. However, neither soluble polymer support proved as suitable as the insoluble JandaJel-supported (salen)-Mn complex for the epoxidation because residual impurities during precipitation and leaching of Mn from the complex, resulted in lowered yields. [Pg.253]

Fig. 4.6. Method for determining the concentration of residual impurities, [Impjj jjj., in a reaction mixture if the impurity is a catalyst or co-catalyst. The observed variable x can be peak-height h for a GLC method, absorbance A for spectroscopy, conductivity k for conductimetry, current i for polarography, or rate constant k for kinetics, etc. Fig. 4.6. Method for determining the concentration of residual impurities, [Impjj jjj., in a reaction mixture if the impurity is a catalyst or co-catalyst. The observed variable x can be peak-height h for a GLC method, absorbance A for spectroscopy, conductivity k for conductimetry, current i for polarography, or rate constant k for kinetics, etc.
Oxine (5) fonns complexes of analytical applicability with various metal ions. A RP-HPLC-FLD method (Xex = 370 nm, Xg = 516 nm) was proposed for simultaneous determination of Al(III) and Mg(II), using a Cjg column. Various details of the method are noteworthy Optimization of the method showed that for both ions it is best to have also precolumn and in-column complex formation, caused by the presence of 5 in the injection loop and in the carrier solution FLD detection is preferable to simple UVD because it avoids the background of 5 and interference of various ions forming nonfluorescent chromogenic complexes, e.g. Ca(II) and Zn(II) the intensity of the fluorescence can be increased by micelle formation on addition of SDS and neutralized Af,Af-bis(2-hydroxyethyl)-2-aminoethanesulfonic acid (6). The LOD (SNR = 3) were 0.74 (xM (18 ppb) Mg(n) and 0.60 (xM (16 ppb) Al(III) the latter was attributed in part to residual impurities in the purified water -... [Pg.274]

Scavenging of residual impurities in the solution may be necessary ifth e rate-potential relation betrays the effects of impurities in the solution by some kind of aberrant behavior. One introduces a large auxiliary electrode of high area platinum black and changes the potential on it slowly and cyclically over the range of potentials of the intended experiment (Bockris and Conway, 1949). A day or so of this cycling may be necessary and the platinum black sheet (which now contains deposited or adsorbed impurities) must be removed carefully with the potential still on (so that the impurities do not desorb back into the solution). [Pg.377]

A suspension of 0.76 g LAH in 50 mL THF was stirred under an inert atmosphere, and treated with the dropwise addition of a solution of 2.5 g N-(benzyloxycarbonyl)-4-methoxytryptamine in 30 anhydrous THF. The reaction mixture was held at reflux for 30 min, then cooled to 40 °C and the excess hydride destroyed with the addition of 50% aqueous THF. The solids were removed by filtration, washed with THF, the filtrate and washings combined, and the solvent removed under vacuum. The residue, impure 4-methoxy-N-methyltryptamine, was dissolved in 50 mL ethanol, treated with 1.0 mL acetone, then with 0.5 g 10% Pd / C, and the reaction mixture shaken under a hydrogen atmosphere at 50 psi for 15 h. The catalyst was removed by filtration through a bed of Celite, the filtrate stripped of solvent under vacuum, and the solid residue recrystallized from Et20 / hexane to give 0.51 g 4-methoxy-N-methyl-N-isopropyltryptamine (4-MeO-MIPT) which had a mp 80-81 °C. Anal C15H22N20. C,H,N. MS (in m/z) C5H12N+ 86 (100%) indolemethylene+ 160 (4%) parent ion 246 (6 %). [Pg.202]

The critical unit operations that should be monitored and/or optimized are the reaction and fermentation steps for the purpose of increasing API yield and reducing the residual impurity profile. Other critical unit operations that are especially important to the end user (pharmaceutical dosage form operations) include precipitation or crystallization, milling, sizing, and purification operations, which may affect the physical properties (particle size and shape, bulk powder flow, blend uniformity, and compressibility) of the API. [Pg.409]


See other pages where Impurities residual is mentioned: [Pg.245]    [Pg.11]    [Pg.205]    [Pg.435]    [Pg.487]    [Pg.374]    [Pg.932]    [Pg.411]    [Pg.101]    [Pg.366]    [Pg.369]    [Pg.463]    [Pg.182]    [Pg.254]    [Pg.75]    [Pg.33]    [Pg.74]    [Pg.890]    [Pg.126]    [Pg.98]    [Pg.72]    [Pg.43]    [Pg.155]    [Pg.55]    [Pg.88]    [Pg.321]    [Pg.78]    [Pg.1474]    [Pg.922]    [Pg.351]    [Pg.354]    [Pg.448]    [Pg.97]    [Pg.220]   
See also in sourсe #XX -- [ Pg.10 , Pg.22 , Pg.295 ]




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Residual gas impurity

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