Remote plasma sources

Kinetics of F-Atom Generation from NF3, CF4, and C2F6 in Remote Piasma Sources 

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Effectiveness of F Atom Transportation from Remote Plasma Source... 

Downstream region (plasma technology) Plasma outside the plasma generation region. See Remote plasma source Afterglow region. 

Remote plasma source (plasma) A plasma source where the plasma is generated in one region and used in another (downstream) region. 

Source plasma containing small amounts of anti-C(G) erroneously shipped to a fractionator whose specifications precluded it no FDA violation involved, same material accepted by other fractionators, and risk to final product very remote. 

Table 11.1. Physical properties of hydrocarbon films deposited with a remote electron cyclotron resonance plasma from three different C2Hz source gases at three different dc self-bias voltages 1% np represents the parallel component of the real part of the refractive index as measured by in situ ellipsometry. The film composition is obtained from ion-beam analysis. The total particle number densities nc and n-H are calculated from the stoichiometry and the film thickness. Deposition parameters pressure p = 0.2 Pa adjusted with gas flow at constant pumping speed, absorbed microwave power density P = 10 kW nT3 [17]...

Due to their remote operation, plasma jets are particularly suited for treatment of three-dimensional (3D) structures and for selective surface modifications of specific parts. The treatment of plastics by small-sized atmospheric plasma jet sources based on RF discharges was reported in Ref. [44]. 

Typically, an ECR discharge is established at 1 kW, 2.45 GHz, 800-1000 gauss, and O.l-lOmTorr gas pressure with an electron density of lO -lO electrons/cm and a self-bias (plasma potential) of 10-20 volts in the remote substrate position. Auxiliary magnetic fields may be used in the vicinity of the substrate to increase plasma uniformity over the substrate surface. The ECR sources suffer from the difficulty in scaling them up to large-area sources. 

The sputter deposition system consists (in a general case) of a vacuum chamber, sputter sources, a substrate holder and a pumping system. The control panel selects the target source and substrate position and controls the sputtering power. The vacuum system contains a mechanical pump, a turbo pump, throttle valve, and chamber. The separate RF power supply is remote. It supplies the RF power needed to generate plasma in the deposition chamber. 

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