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Reactive plasma system

Reaching the siuface in a reactive-plasma system and reacting with the surface or the so-called dangling chemical bonds to finally attach to the surface... [Pg.234]

Current research into reactive atmospheric plasma techniques for the nanocoating of textile substrates includes a new atmospheric CoatingStar [16] technology for the appHcation of microcapsules [17] in aerosol form. Atmospheric plasma treatments represent an alternative to the (post) treatment of textiles. A schematic representation of the reactive plasma system is illustrated in Figure 7.10. [Pg.241]

Experimentally, there has been but little direct observation of the reactive intermediates present in this, or any other, t5rpe of discharge, as it is extraordinarily difficult to analyze a reactive plasma without perturbing the system. [Pg.190]

C2F4 plasmas are the well-investigated fluorinated carbon plasma systems by OES diagnostics according to literature with conventional plasma sources. However, without influence of ionization, these cases turned out to be the case 3 described earlier, i.e., the formation of chemically reactive species that do not emit photons by the energy transfer mechanism. [Pg.52]

In some cases, particularly in a gas system of polar molecules AB, fiee electrons or ions are solvated with 15-dipoles to form solvated electrons and ions, respectively (Hatano, 1986). Such species would have an important role in reactive plasmas. [Pg.233]

Figure 7 Schematic of selective gas phase reactive plasma-developed resist system... Figure 7 Schematic of selective gas phase reactive plasma-developed resist system...
The use of variable chemistry in these systems allows versatility by optimizing reactive gases for the specific application. Next generation atmospheric plasma systems are being engineered for other performance features of vacuum plasma technologies, such as plasma-enhanced chemical vapor deposition (PECVD). [Pg.33]

In situ cleaning (PVD technology) Cleaning in the deposition system. Examples Ion scrubbing reactive plasma cleaning sputter cleaning. [Pg.637]

The application of high tension (e.g. 20 kV, 0.5 MHz) in an evacuated system (0.2. .. 8 torr) causes the residual gas to form a highly ionized mixture of positive and negative ions, electrons, photons and neutral gas molecules. In the presence of active sorbents this plasma reacts with the chromatographically separated substances to eld reactive ions and radicals. [Pg.28]


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See also in sourсe #XX -- [ Pg.241 ]




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Reactive plasma

Reactive system

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