Radiation resistance ultraviolet irradiation

The U.S. - Australia Symposium on Radiation Effects on Polymeric Materials contained research presentations on fundamental radiation chemistry and physics as well as on technological applications of polymer irradiation. This paper represents a hybrid contribution of these two areas, examining a field of extensive technological importance. Spin casting of radiation sensitive polymer resists for microelectronic fabrication was studied using photophysical techniques that are sensitive to the fundamental radiation response in the ultraviolet range. 

Trifluoronitrosomethane (b.p. 86.0°C, 767 mm Hg) is of considerable interest as a component of high temperature-resistant elastomers. This compound has been prepared by treatment of trifluoroiodomethane, in the presence of mercury, with nitric oxide in a photochemical reactor whose mercury lamp emitted radiation at 253.7 mp.. The preparation is particularly sensitive to the initial pressure of the gases, reactant ratio, irradiation time, intensity of the ultraviolet radiation, reaction temperature, and method of removal of nitric oxide from the product [60]. 

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