Precursor deposition

Material Deposited Common Precursors Deposition Temp. °C Applications Status... 

The decomposition yields the metal and hydrocarbons. The TMA reaction has a tendency to leave carbon incorporated in the metal. Both TEA and TIBA have very low vapor pressure at room temperature and are consequently difficult to use. DMAH is generally the preferred precursor. Deposition temperature range is 200-300°C and pressure up to 1 atm (Note these alkyls are pyrophoric.)... 

Surface chemical reaction leading to precursor deposition and film growth (6). 

Ferroelectric oxide Precursors Deposition method Reference... 

Mixed metal oxide Precursors Deposition method References... 

Aglucones are released by p-glucosidase on a pest attack from their preinfectional glucosidic precursors deposited in the plant cell vacuole, as will be shown below. Furthermore, aglucones can be passively set free into the environment by rotting plant material [62] or actively by root exudation [63]. An overview on benzoxazinone aglucones is given in Fig. (3). 

Fig. 2. Influence of the reaction temperature on DRIFTS patterns Precursor deposited on sihca at (a) 160°C, (b) 180°C, (c) 220°C, (d) and (e) 260°C. Samples (a, b, c and d) are taken from the top and sample (e) from the bottom part of the ALD reactor bed. For comparison, pure silica pretreated at 600°C is shown as well (f).

Caruso, F. et al., Hollow titania spheres from layered precursor deposition on sacrificial colloidal core, Adv. Mater., 13, 740, 2001. 

Monometallic Pd(5 wt.%)jC and Bi(5 wt.%)IC catalysts the selected carboxylate precursor of palladium or bismuth (see above) was dispersed in the presence of 7.2 g of the activated carbon in 250 ml n-heptane under ultrasonic stirring for 30 min. The hydrocarbon was evaporated very slowly at room temperature under vacuum and the precursor deposited on the support was subsequently decomposed upon heating under nitrogen at 773 K during 18h. 

Precursor Deposition temp. [°C] M S ratio Phase observed Ref. 

Solid precursor deposition directly onto the tip (generally followed by heating and melting of the material on the tip to allow the material to flow and better coat the tip)... 

Two-dimensional phase formation occurs preferentially when a strong suhstrate-metal interaction exists, a process that typically involves the formation of growth centers a few atoms thick, that expand and coalesce to form a monolayer that serves as a precursor deposit to subsequent two-dimensional metal layers. 

Films deposited at this condition are characterized using various surface analysis techniques. FTIR-ATR, XRD, SEM, LSM, Raman spectral and XPS analyses give the conclusion that when methane is used as a precursor, deposited film is amorphous... 

PtClg] and cations Cu " ", Cd " ", In + and Sn + have been found to sorb on the surface of spinel supports at the deposition of their precursors from the single component and binary solutions when the solution pH is lower than the isoelectric point of a supi)ort. Precursors of platiniun and modifying cations affect mutually and in a complex manner the sorption from the binary impregnating solutions. Possible mechanisms of precursor deposition on the surface of spinels are discussed. 

Allen et al., 2001 investigated the effect of DLC coatings (obtained by fast-atom bombardment from a hexane precursor) deposited on polystyrene 24-well tissue culture plates on two osteoblast-like cell lines cultured on uncoated and DLC-coated plates for up to 72 h, by measuring the production of three osteoblast-specific marker proteins alkaline phosphatase, osteocalcin and type 1 collagen. According to Allen et al. (2001), there was no evidence that the presence of the DLC coating had an adverse effect on any of these measured parameters, which are indicative of metabolic processes in these osteoblast-Uke musculoskeletal system cells. 

---