Polyferrocenylsilanes fabrication

As shown in Fig. 8.9A, a full-color photonic crystal device was designed and fabricated in a form of electrochemical cell (Arsenault et al., 2007). The device was based on a two-component composite, that is, silica microspheres and polyferrocenylsilane (PFS). The silica microspheres with an ordered self-assembly array were deposited on ITO glass substrate and served as the inactive structural scaffold. PFS with pendant unsaturated C=C bonds were incorporated into the lattice spacing of silica microspheres and polymerized... 

Polyferrocenylsilanes can be fabricated into films, shapes, and fibers using conventional polymer processing techniques. The dimethyl derivative 3.22 (R=R = Me), which has been studied in the most detail, is an amber, film-forming thermoplastic (Fig. 3.7a) which shows a Tg at 33°C and melt transitions (T ) in the range 122-145 °C. The multiple melt transitions arise from the presence of crystallites of different size, which melt at slightly different temperatures [65, 100). Poly(ferrocenyldimethylsilane) 3.22 (R=R =Me) can be melt-processed above 150°C (Fig. 3.7b) and can be used to prepare crystalline, nanoscale fibers (diameter 100 nm to 1 pm) by electrospinning. In this method, an electric potential is used to produce an ejected jet from a solution of the polymer in THF, which subsequently stretches, splays, and dries. The nanofihers of different thickness show different colors due to interference effects simUar to those seen in soap bubbles... 

Cao L, Massey JA, Winnik MA, Manners I, Riethmuller S, Banhart F, Spatz JP, Mdller M (2003) Reactive ion etching of cylindrical polyferrocenylsilane block copolymer micelles fabrication of ceramic nanolines on semiconducting substrates. Adv Fund Mater 13 271-276... 

Polyferrocenylsilanes (PFSs) have attracted growing interest since the early 1990s. ° These materials exemplify the types of polymers accessible by the use of the novel ring-opening polymerization (ROP) approach. PFS materials can be easily fabricated and processed as films, gels, and monoliths, and have even been... 

Patterned organometallic multilayers may be of interest also as etch barriers in RIE processes. For this purpose it is essential that these films can be fabricated from etch resistant organometallic polyferrocenylsilane chains only, as organic polymers offer no resistance to reactive ion etching. This chapter deals with the formation of continuous organometallic multilayer thin films, and with the fabrication of patterned organometallic thin films, formed by area-selective deposition of organo-metaUic polyions on prepattemed substrates. 

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