PLD Instrumentation and Parameters for ZnO

The second main part of a PLD system is the vacuum chamber. The author s group developed a large-area PLD process for the double-sided deposition of high-Tc superconducting thin films (see for example [8,10]). As substrate heater an arrangement of KANTHAL wire in ceramic tubes is used 

The initial investment cost of the Nd YAG is less than half that of the excimer laser 

The typical parameters for the PLD of epitaxial ZnO-based thin films on sapphire including information about target preparation are listed in Table 7.3. Within the range of these software controlled parameters, the properties of the deposited films differ widely, as will be shown in Sect. 7.4. Beside the parameters listed in Table 7.3, the film properties will be influenced furthermore by a few more internal effects, which will be listed and discussed in the following according to the scheme effect/problem-cause-solution. Only the careful consideration of all these hidden effects by experienced operators can ensure the highest quality and reproducibility of PLD grown films. 

In situ ellipsometer ports 2 ports, angle of incidence 70° 

Laser focusing lens UV fused silica uncoated, / = 300 mm 

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