Plasma capacitively coupled discharge

Most of plasma polymerizations have been carried out in the frequency range from 50 Hz to 13.56 MHz with using the capacitively coupled discharge system (.4,16). For the inductively coupled discharge system, a frequency of 13.56 MHz was mostly used as a discharge frequency (17,18). In this paper, the discussion will be concentrated on the discharge in the capacitively coupled discharge system. 

Plasma Polymerization of Tetrafluoroethylene in a Capacitively Coupled Discharge with Internal Electrodes... 

Inductively or capacitively coupled discharges on the other hand do not have electrodes in direct contact with the gaseous plasma region and hence are frequently referred to—sometimes without adequate distinction—as electrodeless discharges. The electric field is generated... 

FIG. 4. Schematic representation (a) of a parallel-plate, capacitively coupled RF-discharge reactor, with unequal-size electrodes. The potential distribution (b) shows the positive plasma potential Vp and the negative dc self-bias voltage... 

Physical and Electrical Characteristics. The electrical potentials established in the reaction chamber determine the energy of ions and electrons striking the surfaces immersed in a discharge. Etching and deposition of thin films are usually performed in a capacitively coupled parallel-plate rf reactor (see Plasma Reactors). Therefore, the following discussion will be directed toward this configuration. 

One particular example of what may be called a gas-liquid discharge microreactor is the work of Baba et al. (2006, 2007), who have demonstrated the generation of an atmospheric pressure glow-discharge plasma in contact with liquid paraffin, using a capacitively coupled plasma method. The choice for paraffin has two reasons no hydroxyl group present (which is thought to capture electrons, as is the case in water)... 

Figure 11 Geometries of plasma-assisted CVD reactors (A) parallel-plate discharge, (B) tube with capacitive coupling, (C) tube with inductive coupling.13...

High-frequency discharges at low power and with capacitive power coupling, known as the stabilized capacitively coupled plasma (SCP), as described by Gross et al. [432]... 

Fig. 103. Capacitively coupled microwave plasma (A) [442] and microwave induced plasma discharges (B, C). (B) MIP in a TMoio resonator according to Beenakker (a) cylindrical wall, (b) fixed bottom, (c) removable lid, (d) discharge tube, (e) holder, (f) coupling loop, (g) PTFE insulator, (h) ...

Kushner, M.J. Mechanisms for power deposition in Ar/SiH4 capacitively coupled RF discharges. IEEE Trans. Plasma Sci. 1986, PS-14, 188-196. 

Fig. 9. Time variation of the electrode V(t) (dashed lines) and plasma Vp(t) (solid lines) potentials in a capacitively-coupled (diode) RF discharge for different coupling configurations. After [28].

Application to capacitively-coupled reactors Figure 24a shows the electron temperature distribution in an argon discharge sustained in a one-dimensional parallel plate reactor of the kind shown in Fig. 7. The temperature peaks near the plasma-sheath interface, where the product of the current and electric field (Eq. 31) is highest, and steep gradients develop in that region. Electrons which diffuse towards the electrode during the sheath potential minimum (around r = 0.25 at left electrode, see also Fig. 

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