Non-chemically amplified positive resists based on main chain scission

2 Non-chemically amplified positive resists based on main chain scission [Pg.323]

1 Resists based on poly(methyl methacrylate) and Its derivatives [Pg.323]

Haller, M. Hatzakis, and R. Srinivasan, IBM. J. Res. Dev. 12, 251 (1968) K. Harada, T. Tamamura, and O. Kogure, Detailed contrast y value) measurements of positive electron resists, J. Electrochem. Soc. 129, 2576 (1982) M. Kakuchi, V.S. Sugawara, K. Murase, and K. Matsuyama, Poly (fluoro methacrylate) as highly sensitive, high contrast positive resist, J. Elec trochem. Soc. 128, 1759 (1977). [Pg.323]

Mochiji et al. Negative patterning of AZ1350J hy electron heam desensitization of photo sensitive compound, Jpn. J. Appl. Phys. 20(Suppl. 20 1), 63 (1981) T.D. Berker, The use of photo resists as negative electron resists, Proc. SPIE 469, 151 (1984). [Pg.323]

Reiser, Photoreactive Polymers The Science and Technology of Resists, p. 319, John Wiley Sons, Hohoken, NJ (1989). [Pg.323]

Big Chemical Encyclopedia