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Photoreactive Polymers

A. Reiser, Photoreactive Polymers, John Wiley and Sons, Inc., New York, 1989. [Pg.395]

This polymer contains carboxylic as well as acrylic functionality. The acrylic part of the polymer undergoes light induced polymerization. Use of this photoreactive polymer eliminated the need for separate acrylic type polymerizable monomer(s). [Pg.172]

Note 1 Examples of the changes in photosensitive polymers are a change in molecular shape (photoresponsive polymer), a change in its constitution (photoreactive polymer), and a reversible change in color (photochromic polymer). [Pg.246]

V. V. Kronganz, A. D. Trifunac (Eds), Processes in Photoreactive Polymers, Chapman and Hall, New York (1995)... [Pg.261]

Reiser A., Photoreactive Polymers The Science and Technology of Resists, John Wiley Sons, New York (1989). [Pg.82]

Dr. Vadim Krongauz, an extremely talented chemist, who worked at DuPont from 1987 to 1992 undertook many studies in which he investigated the role of HABIs in various photopolymer systems. In 1995, his book Processes in Photo-reactive Polymers (Processes in Photoreactive Polymers, V. V. Krongauz and A. D. Trifunac, Eds., Chapman Hall, New York) was published. Regrettably, some of the information relating to Dylux was not entirely correct, but this book includes an informative article by Koko Maeda, in which he described HABIs as the choice initiators for photopolymers. ... [Pg.257]

This polymer contains 2,6(7)-dihydroxy[l,3,5(6),7(8)-tetramethylan-thracene] units [40] and has shown promise as a photoreactive polymer... [Pg.572]

New photoreactive polymers with dimethylmaleimide side groups have been prepared, "" and co-polymers of methyl methacrylate with oligourethanes have tensile properties superior to those of the separate homopolymer systems."" New monomers have been prepared for fire-retardant u.v.-curable polymers " and trimethylolpropane has been photopolymerized in the vapour phase. Diphenylsulphoniumbis(methoxycarbonyl)methylide photoinitiates the polymerization of styrene and methyl methacrylate through the formation of... [Pg.484]

It is noteworthy that the final thickness of the coating is not much affected by the depth of the coating resin layer, but depends essentially on the thickness of the polymeric photoinitiator layer, which in turn is affected by the concentration of the solution of the photoreactive polymer used for the spin crating process (Table 30). Interdiffiision between the solid photoinitiator layer and the liquid resin on the top nnay play a crucial role besides the photochemical and radical processes. A further advantage of the two-layer system process is the need for a much smaller amormt of the polymeric photoinitiator with respect to the conventional UV curing, where a low-molecular-weight system in employed [96]. [Pg.192]

Seki, T. Mono- and Multilayers of Photoreactive Polymers as Collective. nid Active Supramolecular Systems. Supramol, Set. 3, 25 (1996). [Pg.215]

Reiser A (1989) Photoreactive polymers, the science and technology of resists. Wiley, New York, NY... [Pg.223]

A.L.R. Williams and D.G. Borden, The preparation and properties of photoreactive polymers I. 2 (arylvinyl) N vinylpyridinium arylsulfonate polymers, Makromol. Chem. 73, 203 (1964) D.G. Borden and J.L.R. Williams, Photopolymer design Photocrosslinkable styrylpyridinium substituted vinyl polymers with absorption maxima from 270 nm to 540 nm, Makromol. Chem. 178, 3035 (1977) K. Ichimura and N. Oohara, J. Polym. Set, Polym. Chem. Ed. 25, 3063 (1987) K. Ichimura and S. Watanabe, Immobilization of enzymes with use of photosensitive polymers having the stilbazolium group, J. Polym. Sci. Polym. Chem., Ed. 18, 891 (1980) K. Ichimura, Prep aration of water soluble photoresist derived from poly(vinyl alcohol), J. Polym. Sci. Polym. Chem., Ed. 20, 1411 (1982) Preparation and characteristics of photocross linkable poly(vinyl alcohol), 20, 1419 (1982). [Pg.208]

A. Reiser, Photoreactive Polymers The Science and Technology of Resists, John Wiley Sons, Hoboken, NJ (1989) H. Ito, Chemical amplification resists for microlithography, Adv. Polym. Sci. 172, 37 245 (2005) L.F. Thompson, C.G. Willson, and M.J. Bowden, Eds., Introduction to Microlithography, American Chemical Society, Washington, DC (1994) T. Ueno, Chemistry of... [Pg.286]

V.V. Ershov, G.A. Nikiforov, and C.R.H.I. de Jonge, Quinone Diazides, Elsevier, Amsterdam (1981). A. Reiser, Photoreactive Polymers The Science and Technology of Resists, p. 187, John Wiley Sons, Hohoken, NJ (1989) R. Dammel, Diazonaphthoquinone based Resists, pp. 13 15, SPIE Press, Belhngham, WA (1993). [Pg.292]


See other pages where Photoreactive Polymers is mentioned: [Pg.759]    [Pg.466]    [Pg.106]    [Pg.819]    [Pg.249]    [Pg.387]    [Pg.759]    [Pg.154]    [Pg.189]    [Pg.76]    [Pg.113]    [Pg.185]    [Pg.13]    [Pg.373]    [Pg.345]    [Pg.534]    [Pg.102]    [Pg.102]    [Pg.205]    [Pg.207]    [Pg.297]    [Pg.300]   
See also in sourсe #XX -- [ Pg.3 , Pg.12 , Pg.14 ]




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Photoreactive coordination polymers

Photoreactive ladder coordination polymers

Sensitized photoreactions of polymers in solution

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