Nickel epitaxial growth

A series of nucleation and growth models was developed by, for example, Bewick et al. (11), Armstrong and Harrison (16), and Scharifker and Hills (17). Amblart et al. (18) have shown that nickel epitaxial growth starts with the formation of three-dimensional epitaxial crystallites. An electrochemical model for the process of electroless metal depositions (mixed-potential theory) was suggested by Paunovic (14) and Saito (14b). 

Uyeda s group investigated by electron microscopy and diffraction (75) the epitaxial growth of amino acids on the (001) plane of nickel film or on the one modified with amino acid at a specific pH and temperature. The most preferable positions for the mutual orientation of both crystals, nickel... 

Silicide layers can also be grown on Pt surfaces.247 The preferential facets of epitaxial growth are the 111. Atom-probe data reveal that the stoichiometry of the silicide phase is Pt2Si, and the Pt-Pt2Si interface is also very sharp. However, a small fraction of silicon atoms can diffuse into the Pt matrix. Formation of silicide layers on a nickel emitter surface is much more complicated where silicide layers of varying stoichiometries are formed.246,247 Owing to the statistical nature of the atom-probe data, identification of all the silicide phases in a nickel silicide layer is at best uncertain. 

Engineering the required texture in a (RE)BCO tape is a much more complex matter than in the case of the Bi-2223 tape. One approach is to prepare a nickel tape with a carefully controlled crystalline surface texture. This forms the substrate for the development of a correspondingly textured thermally grown oxide layer which, in turn, forms the substrate for the epitaxial growth of MgO by electron beam evaporation. The textured MgO serves as the substrate for the epitaxial growth of the 1 /mi thick (RE)BCO via pulsed laser deposition. 

The epitaxy of nickel electrodeposits has been studied by electron microscopy using a new method for the preparation of sections [6.67, 6.68]. It was demonstrated that the electrodeposit structure results from competition between a simple epitaxial growth process maintaining substrate orientation and the formation of new randomly oriented nuclei which are rapidly submitted to the selection process, giving a fiber texture. TTiis competition depends on both the substrate orientation and the nucleation and growth processes leading to the final texture. 

In metallurgy, according to Ramachandran et al., hydrogen is used in the reduction stage in the production of nickel in a process known as the Sheritt Gordon Process. In electronics, hydrogen is used in the epitaxial growth of polysilicon by wafer and circuit manufacturers. 

Graphene can be prepared using four different methods [183]. The first is chemical vapor deposition (CVD) and epitaxial growth, such as the decomposition of ethylene on nickel surfaces. The second is the micromechanical exfoliation of graphite. The third method is epitaxial growth on electrically insulating surfaces, such as SiC, and the fourth is the solution-based reduction of graphene oxide (Fig. 31.17). 

Y Sato, H Fujita, T Ando, T Tanaka, M Kamo. Local epitaxial growth of diamond on nickel from the vapor phase. In A Lettington, JW Seeds, eds. Thin Diamond Films. London Chapman Hall, 1994, p 56. 

Three-dimensional epitaxial crystallites (TECs) were observed in the first stages of electrodeposition of copper (Section 7.15, Ref. 18) and nickel (Section 7.15, Ref. 25) on copper substrates. TEC of nickel formed on copper-film substrate from the nickel sulfate solutions in the low concentration are rectangularly shaped with edges averaging 1300 A in length. The coherent deposit was formed by growth and coalescence of TEC. The continuous deposit was observed when the average thickness was 20-50 A. 

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