Nanometer patterning

The deformation of the nanometer patterns, which has also been observed in the case of other polymeric planarizing materials, is caused by a lack of mechanical integrity of the bottom resist during O2RIE processing. Because of this mechanical instability, the minimum linewidth and pitch were limited to about 70 nm and 120 nm, respectively. Forced cooling of the substrate may prevent this problem from occurring. 

Seo, L, M. Pyo, and G.J. Cho. 2002. Micrometer to nanometer patterns of polypyrrole thin films via microphase separation and molecular mask. Langmuir 18 7253-7257. 

Electron beams (EBs) can also be employed for the fine-scale (tens of nanometers) patterning of polymer structures, because of their short (de Broglie) wavelength [14]. Here the charged character of the writing particles limits the resolution because of interparticle electrostatic interactions that produce scattering and... 

Ishii, T., Takamura, T., Shigehara, K., 2000. Fullerene-derivative nanocomposite resist for nanometer pattern fabrication fullerene-derivative nanocomposite resist for nanometer pattern fabrication. Japan Journal of Applied Physics 39, 1068-1070. 

The fabrication process of the nanostructured Si molds started with pattern generation of the objects using a combination of DesignCAD LT and Nanometer Pattern... 

Boker A., Muller A.H.E., and Krausch G., Functional ABC triblock copolymers for controlled surface patterns of nanometer scale, Polym. Mater. Sci. Eng., 84, 312, 2001. 

For instance, with the introduction of SR sources, particles with a radius of a few nanometers can be studied with conventional methods. This has also stimulated a new kind of microscopy, named diffraction microscopy, where the Fraunhofer diffraction intensity patterns are measured at fine intervals in reciprocal space. By means of this oversampling a computer assisted solution of the... 

X-ray diffraction patterns were recorded on a Philips PW1820 diffractometer with Cu-Ka radiation (X = 0.154 nm). The collected sample was indexed very well as cubic a-Mn203 bixbyite (JCPDS 41-1442, la-3, a = 0.941 nm) (Fig. 1). The morphologies were visualized by scanning electron microscopy (SEM) (Fig. 1). The abundant well-defined hexagonal-like plates with the sizes from several hundred nanometers to a few micrometers were formed during hydrothermal treatment, which kept initial shape after 700 °C-calcination (Fig. 1). The hexagonal plates are about 50 nm thick with smooth surfaces. 

Cover Illustration Atomic force microscopy image of molybdenum oxide particles on flat, silicon dioxide substrate, which serves as a model system for a supported catalyst. The area shown corresponds to one square micrometer the maximum difference in height is approximately 10 nanometer. The superimposed curve is the secondary ion mass spectrum of the model catalyst, showing the caracteristic isotopic patterns of single molybdenum ions and of molybdenum oxide cluster ions. 

A graphoepitaxy method has been developed in which a topographic top-down defined pattern on a substrate is used to direct the epitaxial growth in an overlaying block copolymer bottom-up nanostructure by creating a periodic thickness profile (Fig. 5). Fasolka and coworkers [66] employed a faceted silicon substrate, which has sawtooth-profile corrugations in the nanometer... 

The possibilities afforded by SAM-controlled electrochemical metal deposition were already demonstrated some time ago by Sondag-Huethorst et al. [36] who used patterned SAMs as templates to deposit metal structures with line widths below 100 nm. While this initial work illustrated the potential of SAM-controlled deposition on the nanometer scale further activities towards technological exploitation have been surprisingly moderate and mostly concerned with basic studies on metal deposition on uniform, alkane thiol-based SAMs [37-40] that have been extended in more recent years to aromatic thiols [41-43]. A major reason for the slow development of this area is that electrochemical metal deposition with, in principle, the advantage of better control via the electrochemical potential compared to none-lectrochemical methods such as electroless metal deposition or evaporation, is quite critical in conjunction with SAMs. Relying on their ability to act as barriers for charge transfer and particle diffusion, the minimization of defects in and control of the structural quality of SAMs are key to their performance and set the limits for their nanotechnological applications. 

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