Nanoimprint schematic

One of the most successful lithographic techniques is nanoimprint hthography (NIL), mainly because both its working principle and operation are quite simple (Chou et al, 1996). A schematic diagram of the NIL technique is shown in Fig. 3.22. 

Fig. 1 Schematic of (A) nanoimprint lithography and (B) step-and-flash imprint lithography. (View this art in color at www.dekker.com.)...

FIGURE 5.5.32 Schematic of nanoimprint hthography (NIL). (1) A rigid mold is pressed into a thermoplastic resist, heated above its glass transition temperature, to create an imprint. (2) The mold is removed, leaving behind the patterned resist. (3) An anisotropic etch removes the residual resist and transfers the pattern into the substrate. (From S. Y. Chou et al., J. Vac. Sci. Technol, B, 14, 4129, 1996.)... 

Figure 14.11 Schematic of the nanoimprint lithography approach for creating nanostructured heterojunction devices.

Fig. 13.9 Schematic of roll-to-roll nanoimprint lithography process...

Figure 2.1 Schematic of the nanoimprint lithography process (Reprinted with permission from [10]. Copyright (1997) American Institute of Physics.)...

Figure 2.2 Schematic of a continuous roll-to-roll nanoimprinting setup, consisting of a coating (A) and an imprinting module (B), followed by a metal deposition process (C). (Reprinted with permission from [26]. Copyright (2008) Wiley-VCH Verlag GmbH, Co. KCaA.)...

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