Models/modeling thin film processing

From (2.18a), obviously, for the derivation of the full B-M model thin film problem, when the free surface deformation [5 = 0(1) in equation h = 1 + 5 Tj] plays an essential role, it is necessary to assume that the Froude number Fr is 0(1). As consequence we must consider the following incompressible limit process ... 

The theory of seaweed formation does not only apply to solidification processes but in fact to the completely different phenomenon of a wettingdewetting transition. To be precise, this applies to the so-called partial wetting scenario, where a thin liquid film may coexist with a dry surface on the same substrate. These equations are equivalent to the one-sided model of diffusional growth with an effective diffusion coefficient which depends on the viscosity and on the thermodynamical properties of the thin film. 

This chapter describes a DML model proposed by the authors, based on the expectation that the Reynolds equation at the ultra-thin film limit would yield the same solutions as those from the elastic contact analysis. A unified equation system is therefore applied to the entire domain, which gives rise to a stable and robust numerical procedure, capable of predicting the tribological performance of the system through the entire process of transition from full-film to boundary lubrication. 

We have seen that the deposition of crystals from the vapor is much too slow to model by MD techniques. Most laboratory equipment for producing thin films involves relatively slow crystal growth processes, and is not suitable for direct simulation. Information on the stability and properties of thin films can be obtained by similar modeling techniques, however. We describe below some of our results that provide necessary data to find the equilibrium configuration of thin films at low temperatures. 

We have undertaken a series of experiments Involving thin film models of such powdered transition metal catalysts (13,14). In this paper we present a brief review of the results we have obtained to date Involving platinum and rhodium deposited on thin films of tltanla, the latter prepared by oxidation of a tltanliua single crystal. These systems are prepared and characterized under well-controlled conditions. We have used thermal desorption spectroscopy (TDS), Auger electron spectroscopy (AES) and static secondary Ion mass spectrometry (SSIMS). Our results Illustrate the power of SSIMS In understanding the processes that take place during thermal treatment of these thin films. Thermal desorption spectroscopy Is used to characterize the adsorption and desorption of small molecules, In particular, carbon monoxide. AES confirms the SSIMS results and was used to verify the surface cleanliness of the films as they were prepared. 

GL 16] ]R 12] ]P 15] Using a simple thin-film model for mass transfer, values for the overall mass transfer coefficient were determined for both micro-channel processing and laboratory trickle-bed reactors [11]. The value for micro-reactor processing (fCL = 5-15 s ) exceeds the performance of the laboratory tool Ki a = 0.01-0.08 s ) [11, 12], However, more energy has to be spent for that purpose (see the next section). 

Hydrogenations involving consecutive reactions are common in the organic process industry and even in the hydrogenation of fats. In the fine chemicals industry we have examples of acetylenic (triple) bonds to be selectively converted to olefinic (double) bonds. Lange et al. (1998) have shown, for the comversion of the model substance 2-hexyne into cis-2-hexene, how catalytically active microporous thin-film membranes can accomplish 100% selectivity. This unusual selectivity is attributed to avoidance of backmixing. 

Reaction-diffusion systems can readily be modeled in thin layers using CA. Since the transition rules are simple, increases in computational power allow one to add another dimension and run simulations at a speed that should permit the simulation of meaningful behavior in three dimensions. The Zaikin-Zhabotinsky reaction is normally followed in the laboratory by studying thin films. It is difficult to determine experimentally the processes occurring in all regions of a three-dimensional segment of excitable media, but three-dimensional simulations will offer an interesting window into the behavior of such systems in the bulk. 

Chemical solution deposition (CSD) procedures have been widely used for the production of both amorphous and crystalline thin films for more than 20 years.1 Both colloidal (particulate) and polymeric-based processes have been developed. Numerous advances have been demonstrated in understanding solution chemistry, film formation behavior, and for crystalline films, phase transformation mechanisms during thermal processing. Several excellent review articles regarding CSD have been published, and the reader is referred to Refs. 5-12 for additional information on the topic. Recently, modeling of phase transformation behavior for control of thin-film microstructure has also been considered, as manipulation of film orientation and microstructure for various applications has grown in interest.13-15... 

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