Microlithography processing

Sato [3] and Koyama [4] prepared lactone copolymers, (V) and (VI), respectively, that were effective in positive resist compositions suitable for use in super-microlithography processes such as the manufacture of super-LSI and high-capacity microchips. 

NTEGRATED CIRCUIT (IC) TECHNOLOGY has moved Steadily toward increasing circuit density and improved performance during its brief history. These improvements have been achieved through the development of the microlithography process, which now permits production of devices with feature sizes of 1 fim. Submicrometer devices are actively being developed, and production is expected later in this decade. 

Cole et al. (2001) reviewed physical models for most stages of the microlithography process. For the curing stage, they state that there has been no recent development of cure models since the work of Dill (1975). Dill (1975) presented models that incorporate both light absorption and photopolymer cure kinetics modelling, as shown by the following equations ... 

A number of possible uses of radiation grafting are being explored for microlithography, diazo printing, and various copying and printing processes. 

An outline of these two possible processes of microlithography is shown in Figure 8.1. 

Polymers in microlithography materials and processes / Elsa Reichmanis, Scott A. MacDonald, Takao Iwayanagi. 

The irradiation of polymers is widespread in many industries. For example, microlithography is an essential process in the fabrication of integrated circuits that involves the modification of the solubility or volatility of thin polymer resist films by radiation. The sterilization by radiation of medical and pharmaceutical items, many of which are manufactured from polymeric materials, is increasing. This trend arises from both the convenience of the process and the concern about the toxicity of chemical sterilants. Information about the radiolysis products of natural and synthetic polymers used in the medical industry is required for the evaluation of the safety of the process. 

The three-dimensional circuit elements are fabricated by a series of processes collectively known as lithography . The pattern is first generated in a polymeric film on a device wafer and this pattern is then transferred via etching, into the underlying thin film. The purpose of this book is to review the theory, materials, and processes that are used in the lithographic process. This book is intended to be a tutorial and not a comprehensive review. Each chapter contains many references to which the reader can refer for more detail on any specific aspect of microlithography. 

Robic, J. P. Knight, S. Straub, W. "Mid-UV Perkin Elmer 500 Lithography with AZ4110 Resist A Multifactorial Tool and Process Evaluation," International Conference on Microlithography, Grenoble, France, Oct. 1982. 

Aryl nitrenes have been studied extensively over the last decades and are used in several industrial processes such as microlithography. Aryl nitrenes have also been used in photoaffinity labeling bioorganic molecules. The pursuit for organic magnetic material has sparked renewed interested in nitrene intermediates, which are ideal candidates for magnetic material because of their high spin properties. ... 

Interesting methods have demonstrated that thin films can be deposited and patterned using microlithography. However, there are still difficulties in thermal processing and the resulting films obtained by most of the solution techniques have wide transitions and low critical currents. 

---