Metallic passive films

As described in the chapter on passivity (see Chapter 3.2, Passive Metals ) passive films play a critical role in the field... 

Pitting corrosion is initiated by chloride migration from the electrolyte to the metal-passive film interface. Chloride ions adsorb on the outer metal oxide surface, permeate and interact with the underlying metal [9,10]. Redox reaction at the interface increases... 

Tribocorrosion behavior of passive metals Passive film damage due to rubbing... 

Figure 3-24, Breakdown mechanism of the passive film induced by the enrichment of sulfur at the metal-passive film interface.

It is to be noted that the three following factors are in favor of sulfur remaining at the metal-passive film interface (a) llie sulfur-metal chemical bond is very strong (see Chap. 2), (b) the solubility of S in nickel oxide (which constitutes the inner part of die passive film on Ni and Ni-Fe alloys) is very low, and (c) the electric field across die passive film, which assists die passage of cations fi om the metal-passive film interfece to die passive film-solution interface, should impede the transport of sulfur, which woidd be negatively charged. 

Corrosion protection of metals can take many fonns, one of which is passivation. As mentioned above, passivation is the fonnation of a thin protective film (most commonly oxide or hydrated oxide) on a metallic surface. Certain metals that are prone to passivation will fonn a thin oxide film that displaces the electrode potential of the metal by +0.5-2.0 V. The film severely hinders the difflision rate of metal ions from the electrode to tire solid-gas or solid-liquid interface, thus providing corrosion resistance. This decreased corrosion rate is best illustrated by anodic polarization curves, which are constructed by measuring the net current from an electrode into solution (the corrosion current) under an applied voltage. For passivable metals, the current will increase steadily with increasing voltage in the so-called active region until the passivating film fonns, at which point the current will rapidly decrease. This behaviour is characteristic of metals that are susceptible to passivation. 

In tenns of an electrochemical treatment, passivation of a surface represents a significant deviation from ideal electrode behaviour. As mentioned above, for a metal immersed in an electrolyte, the conditions can be such as predicted by the Pourbaix diagram that fonnation of a second-phase film—usually an insoluble surface oxide film—is favoured compared with dissolution (solvation) of the oxidized anion. Depending on the quality of the oxide film, the fonnation of a surface layer can retard further dissolution and virtually stop it after some time. Such surface layers are called passive films. This type of film provides the comparably high chemical stability of many important constmction materials such as aluminium or stainless steels. 

Highly protective layers can also fonn in gaseous environments at ambient temperatures by a redox reaction similar to that in an aqueous electrolyte, i.e. by oxygen reduction combined with metal oxidation. The thickness of spontaneously fonned oxide films is typically in the range of 1-3 nm, i.e., of similar thickness to electrochemical passive films. Substantially thicker anodic films can be fonned on so-called valve metals (Ti, Ta, Zr,. ..), which allow the application of anodizing potentials (high electric fields) without dielectric breakdown. 

As outlined above, electron transfer through the passive film can also be cmcial for passivation and thus for the corrosion behaviour of a metal. Therefore, interest has grown in studies of the electronic properties of passive films. Many passive films are of a semiconductive nature [92, 93, 94, 95, 96, 97, 98, 99, 100, 101, 102 and 1031 and therefore can be investigated with teclmiques borrowed from semiconductor electrochemistry—most typically photoelectrochemistry and capacitance measurements of the Mott-Schottky type [104]. Generally it is found that many passive films cannot be described as ideal but rather as amorjDhous or highly defective semiconductors which often exlribit doping levels close to degeneracy [105]. 

Concentrated nitric acid renders the metal passive , i.e. chemically unreactive, due to formation of a thin oxide surface film (which can be removed by scratching or heating in hydrogen). 

Condensate systems can be chemically treated to reduce metal corrosion. Treatment chemicals include neutralising amines, filming amines, and oxygen scavenger-metal passivators. 

Chlorides, which are ubiquitous in nature, play an important role in the corrosion of metals. Chlorides and other anions also play an important role in locali2ed corrosion, ie, the breakdown of the insoluble protective reaction product films, eg, passive films, that prevent corrosion of the underlying metal. A variety of mechanisms attempting to explain the role of chloride in general and in locali2ed corrosion have been proposed (23—25). 

Films Once corrosion has started, its further progress very often is controlled by the nature of films, such as passive films, that may form or accumulate on the metallic surface. The classical example is the thin oxide tilm that forms on stainless steels. 

Short-time tests also can give misleading results on alloys that form passive films, such as stainless steels. With Borderline conditions, a prolonged test may be needed to permit breakdown of the passive film and subsequently more rapid attack. Consequently, tests run for long periods are considerably more reahstic than those conducted for short durations. This statement must be quahfied by stating that corrosion should not proceed to the point at which the original specimen size or the exposed area is drastic y reduced or the metal is perforated. 

Generally, pitting corrosion only occurs on passivated metals when the passive film is destroyed locally. In most cases chloride ions cause this local attack at potentials U > U q. Bromide ions also act in the same way [51], The critical potential for pitting corrosion UpQ is called the pitting potential. It has the same significance as in Eqs. (2-39) and (2-48). 

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