Metal oxide nanostructures deposition techniques

On the other hand, liquid phase deposition (LPD) has been demonstrated as a flexible wet chemical method for preparing metal oxide nanostructured films on electrode surfaces. By the LPD process, electroactive titanium dioxide (Ti02) films were prepared on graphite, glassy carbon and ITO. The electrochemical properties of such LPD Ti02 films were dependent upon the film thickness controlled by the deposition time. The LPD technique was easily combined with other techniques, e.g., seed-mediated growth, which could provide metal/metal oxide composite nanomaterials. Moreover, hybrid nanostructured films were facilely obtained by doping dyes, surfactants and other... 

Metal oxide nanostructures have been fabricated using different methods and preparation conditions. The most promising technique is sol-gel processing in combination with dipcoating technique.This method enables us to prepare spinel oxide thin film electrodes at ambient temperature with high level of doping and large surface area [117,118], The physical and chemical vapor deposition is another technique for metal oxide preparation [119,120],... 

There have been several reports of applying sol-gel materials and techniques to the formulatiOTi of nanostructured pyrophoric materials. The application of sol-gel materials to this technology area has involved three different approaches, which include (1) use of the aerogel as a framework for the deposition of pyrophoric materials (2) direct transformation of the aerogel skeleton itself (metal oxide) to a pyrophoric or easily combustible article and (3) use of an aerogel network as a reactive template for the reduction of a second sol-gel metal oxide phase to a pyrophoric or readily combustible material. 

AC and DC responses are useful sources of information about Si-Me/Me"" nanostructured system during cathodic nucleation of metals on silicon and also their anodic oxidation. The impedance dependence on AC frequency is size-sensitive due to diffusion contribution to the interfacial impedance. This allows using potentiodynamic multi-frequency AC probing for fast qualitative characterization of the nanostructured interface at initial stages of metal deposition, when application of other techniques is hindered by nonstationar effects. 

The first part of this section focuses on the main characteristics and fabrication techniques used for obtaining templating membranes and depositing metal nanostructures by suitable electroless and elecuochemical procedures. Methods such as sol-gel (10-12) or chemical vapor deposition (10, 13), which have been used primarily for the template deposition of carbon, oxides, or semiconducting-based materials, will not be considered here in detail. The second part of the section focuses on the electrochemical properties of the fabricated nanomaterials with emphasis on the characteristics and applications of nanoelectrode ensembles (NEEs). 

The electrodeposition method is among the highly efficient techniques that have been used for the formation of various nanocrystalline and nanostructured materials such as thin nanofilms, nanorods, nanowires, and nanosheets. It has been successfully achieved by the deposition of metal or metal alloys on an electrode surface. The process is called electroplating. Electroplating of electrode surfaces is based on the method of electrodeposition [41]. It involves the oxidation of metal ions at... 

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